Substrate with metal film and method for manufacturing the same

A method for manufacturing a substrate with a metal film, comprising:

• preparing a first insulation layer having a first surface and a second surface on an opposite side of the first surface;
• forming a first conductive circuit on the first surface of the first insulation layer;
• forming on the first surface of the first insulation layer and the first conductive circuit a second insulation layer having a first surface and a second surface on an opposite side of the first surface of the second insulation layer such that the first surface of the first insulation layer faces the second surface of the second insulation layer;
• forming in the second insulation layer a penetrating hole which tapers from the first surface of the second insulation layer toward the first conductive circuit;
• applying on an inner wall of the penetrating hole a composition comprising a polymerization initiator, a polymerizable compound and a solvent dissolving the polymerization initiator and the polymerizable compound such that a layer comprising the polymerization initiator and the polymerizable compound is formed on the inner wall of the penetrating hole;
• irradiating the layer comprising the polymerization initiator and the polymerizable compound with an energy such that a polymer is formed on the inner wall of the penetrating hole;
• applying a plating catalyst on the polymer;
• and
• forming a plated-metal film on the inner wall of the penetrating hole.