System for and method for closed loop electrophoretic deposition of phosphor materials on semiconductor devices
AssigneeCree, Inc.
InventorsEric J. Tarsa, Michael Leung, Bernd Keller, Robert Underwood, Mark Youmans
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Abstract
One close loop system and method for electrophoretic deposition (EPD) of phosphor material on light emitting diodes (LEDs). The system comprises a deposition chamber sealed from ambient air. A mixture of phosphor material and solution is provided to the chamber with the mixture also being sealed from ambient air. A carrier holds a batch of LEDs in the chamber with the mixture contacting the areas of the LEDs for phosphor deposition. A voltage supply applies a voltage to the LEDs and the mixture to cause the phosphor material to deposit on the LEDs at the mixture contacting areas.
Claims17
A method for depositing a material on a semiconductor device, comprising:
- providing a chamber for holding a semiconductor device, said chamber sealed from ambient air;
- providing a mixture of material and solution, said mixture placed in said chamber while being sealed from ambient air;
- applying a voltage to said semiconductor device and said mixture to cause said material to deposit on said semiconductor device;
- and
- providing a rinsing liquid, said rinsing liquid placed in said chamber without exposing said rinsing liquid to ambient air, wherein said device remains stationary relative to the chamber while said mixture is provided and throughout the duration of providing said rinsing liquid.
Dependencies are inferred from the claim text.