Method and system for providing a magnetic recording pole having a dual sidewall angle

A method for fabricating a magnetic recording transducer having an air-bearing surface (ABS), the method comprising:

• providing an underlayer having a first portion, a second portion, and a bevel connecting the first portion and the second portion, the first portion having a first thickness and being proximate to the ABS, the second portion having a second thickness less than the first thickness and being distal from the ABS, and a bevel connecting the first thickness and the second thickness;
• atomic layer depositing an intermediate layer, the intermediate layer being substantially conformal with the underlayer and including aluminum oxide;
• providing a photoresist mask covering a portion of the intermediate layer proximate to the ABS;
• depositing a first hard mask layer;
• removing the photoresist mask;
• planarizing the first hard mask layer;
• refilling a portion of the magnetic transducer with a second hard mask layer, the portion of the magnetic transducer being exposed by removing the photoresist mask, the second hard mask layer and the first hard mask layer forming a hard mask layer including Cr and having a top surface substantially perpendicular to the ABS;
• providing a trench photoresist mask covering a portion of the hard mask layer corresponding to the trench;
• depositing a Ta hard mask layer;
• removing the trench photoresist mask, forming an aperture in the Ta hard mask layer corresponding to the trench;
• removing a portion of the hard mask layer and the intermediate layer exposed by the aperture to provide a trench therein, the trench having a bottom surface and sidewalls having a first angle and a second angle, the first angle being between the bottom surface and the intermediate layer, the second angle corresponding to the hard mask layer and being substantially ninety degrees from the bottom surface, the step of removing the portion of the hard mask layer and the intermediate layer further including
• performing a first reactive ion etch (RIE) for removing a portion of the hard mask layer and corresponding to the second angle;
• and
• performing a second RIE for removing a portion of the intermediate layer and corresponding to the first angle, the second RIE being different from the first RIE;
• depositing a seed layer, at least a portion of the seed layer residing in the trench;
• and
• providing a pole, at least a portion of the pole residing in the trench, the pole having a pole tip proximate to the ABS, a yoke distal from the ABS, and a bottom bevel corresponding to the bevel in the underlayer, at least the yoke of the pole including a plurality of sidewalls having a plurality of sidewall angles corresponding to the first angle and the second angle.

A method for fabricating a magnetic recording transducer having an air-bearing surface (ABS), the method comprising:

• providing an underlayer having a first portion, a second portion, and a bevel connecting the first portion and the second portion, the first portion having a first thickness and being proximate to the ABS, the second portion having a second thickness less than the first thickness and being distal from the ABS, and a bevel connecting the first thickness and the second thickness;
• atomic layer depositing an intermediate layer, the intermediate layer being substantially conformal with the underlayer and including aluminum oxide;
• depositing a hard mask layer;
• providing a planarization stop structure on a portion of the transducer;
• planarizing the hard mask layer such that the hard mask layer has a top surface substantially perpendicular to the ABS;
• providing a trench photoresist mask covering a portion of the hard mask layer corresponding to the trench;
• depositing a Ta hard mask layer;
• removing the trench photoresist mask, forming an aperture in the Ta hard mask layer corresponding to the trench;
• removing a portion of the hard mask layer and the intermediate layer exposed by the aperture to provide a trench therein, the trench having a bottom surface and sidewalls having a first angle and a second angle, the first angle being between the bottom surface and the intermediate layer, the second angle corresponding to the hard mask layer and being substantially ninety degrees from the bottom surface, the step of removing the portion of the hard mask layer and the intermediate layer further including
• performing a first reactive ion etch (RIE) for removing a portion of the hard mask layer and corresponding to the second angle;
• and
• performing a second RIE for removing a portion of the intermediate layer and corresponding to the first angle, the second RIE being different from the first RIE;
• depositing a seed layer, at least a portion of the seed layer residing in the trench;
• and
• providing a pole, at least a portion of the pole residing in the trench, the pole having a pole tip proximate to the ABS, a yoke distal from the ABS, and a bottom bevel corresponding to the bevel in the underlayer, at least the yoke of the pole including a plurality of sidewalls having a plurality of sidewall angles corresponding to the first angle and the second angle.