Defect inspection apparatus and method utilizing multiple inspection conditions
AssigneeHitachi High-Technologies Corporation
InventorsKoji Kawaki, Atsushi Takane, Hiroshi Kikuchi, Nobuhiro Obara, Yuji Inoue
Life of this patent
Estimating the term…
Loading patent…
AssigneeHitachi High-Technologies Corporation
InventorsKoji Kawaki, Atsushi Takane, Hiroshi Kikuchi, Nobuhiro Obara, Yuji Inoue
Estimating the term…
To provide a defect inspection apparatus and method adapted to easily assign threshold levels to scattered-light detectors and to appropriately acquire data detected by each scattered-light detector. The apparatus includes a stage device on which to rest a sample; a laser light irradiation device that irradiates the sample on the stage device with inspection light; scattered-light detectors, each of which detects a beam of light, scattered from the sample, and outputs an image signal; a threshold level setter formed so that an associated threshold level for judging whether defects are present is set only for an image signal selected from individual image signals of the scattered-light detectors or from image signals obtained by arithmetic processing based on the image signals, and a threshold level setting circuit that acquires the individual image signals, only if the image signal exceeds the threshold level set in the threshold level setter.
An inspection apparatus comprising:
An inspection method comprising steps of:
Dependencies are inferred from the claim text.