Wavefront aberration measuring apparatus
AssigneeNikon Corporation
InventorTatsuro Otaki
Life of this patent
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Abstract
A wavefront aberration measuring apparatus comprising: an illumination optical system provided to an incident side of a test lens; and a measuring optical system provided to an exit side of the test lens, the illumination optical system including an aperture stop capable of being opened and closed, and the illumination optical system being movable along an optical axis of the illumination optical system so as to adjust positions of the aperture stop and an entrance pupil of the test lens to have an optically conjugate relation with each other. Accordingly, it becomes possible to provide a wavefront aberration measuring apparatus capable of suppressing errors in measured result.
Claims8
A wavefront aberration measuring apparatus comprising:
- an illumination optical system provided to an incident side of a test lens;
- and
- a measuring optical system provided to an exit side of the test lens,
- the illumination optical system including an aperture stop capable of being opened and closed and a projection lens, and
- the illumination optical system being movable along an optical axis of the illumination optical system so as to adjust positions of the aperture stop and an entrance pupil of the test lens to have an optically conjugate relation with each other.
Dependencies are inferred from the claim text.