Lithographic apparatus and device manufacturing method

A device manufacturing method, comprising:

• providing a liquid in a space between a projection system and a substrate, an object, or both, using an inlet located above the substrate, the object, or both, wherein an edge of the substrate, the object, or both, is at least partly surrounded by a body;
• projecting a patterned beam of radiation, through a liquid, onto a portion of the substrate, the object, or both;
• and
• removing fluid from a gap between the body and the substrate, the object, or both, using a port positioned at a side of the gap opposite the projection system and below the substrate, the object, or both.

A lithographic projection apparatus comprising:

• a projection system configured to project a patterned beam of radiation onto a target portion of a substrate, of a sensor, or both;
• a movable table, comprising:
• a body having an aperture to contain the substrate, the sensor, or both, therein, and
• an outlet located below the substrate and/or sensor to remove liquid entering a gap between a lateral edge of the aperture and a lateral edge of the substrate and/or sensor;
• and
• a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the table, the liquid supply system comprising an inlet, located above the substrate table, to supply the liquid to the space.