Semiconductor integrated circuit device and process for manufacturing the same

A semiconductor device comprising:

• a semiconductor substrate;
• grooves formed in the semiconductor substrate and defining an active region and a plurality of dummy active regions;
• first insulating films embedded in the grooves;
• a plurality of dummy gates formed over the dummy active regions and over the first insulating films;
• wherein the active region is configured to function as a part of a semiconductor element;
• wherein the dummy active regions and the dummy gates are configured not to function as the semiconductor element;
• wherein each planar size of the dummy active regions is the same size,
• wherein each planar size of the dummy gates is the same size,
• wherein each of the dummy active regions is arranged with the same pitch,
• wherein each of the dummy gates is arranged with the same pitch, and
• wherein, in a first direction and a second direction perpendicular to the first direction, each of the dummy gates is shifted by half of a distance of the pitch of the dummy active regions.