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US 8,558,198 B2Granted
Beam line system of ion implanter
AssigneeUnited Microelectronics Corp.
InventorBoon-Chau Tong
Life of this patent
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Abstract
A beam line system includes a hollow tube and a plurality of protruding structures. The hollow tube has an inlet and an outlet. An ion beam emitted by the ion implanter is introduced into the hollow tube through the inlet and exited from the hollow tube through the outlet. The protruding structures are formed on an inner wall of the hollow tube. Each of the protruding structures has a reflective surface for reflecting a portion of the ion beam.
Claims18
A beam line system of an ion implanter, the beam line system comprising:
- a hollow tube having an inlet and an outlet, wherein the hollow tube is a collimator tube, an ion beam emitted by the ion implanter is introduced into the hollow tube through the inlet and exited from the hollow tube through the outlet;
- and
- a plurality of protruding structures formed on an inner wall of the hollow tube, wherein each of the protruding structures has a reflective surface for reflecting a portion of the ion beam.
An ion implanter, comprising:
- an ion source for producing ions;
- an analyzing magnet for producing an ion beam by selecting desired types of ions;
- and
- a beam line system for transmitting the ion beam, wherein the beam line system comprises a hollow tube with an inlet and an outlet and a plurality of protruding structures formed on an inner wall of the hollow tube, wherein the hollow tube is a collimator tube, the ion beam is introduced into the hollow tube through the inlet and exited from the hollow tube through the outlet, wherein each of the protruding structures has a reflective surface for reflecting a portion of the ion beam.
1 more element
Dependencies are inferred from the claim text.