Charged particle beam device

A charged particle beam device, comprising:

• a specimen holding unit for holding a semiconductor wafer;
• a specimen stage for moving the specimen holding unit;
• a charged beam column having a function to scan a primary charged particle beam onto a semiconductor wafer placed on the specimen stage and to detect generated secondary charged particles to output secondary charged particle signal;
• and
• a unit for forming an image of the semiconductor wafer from the secondary charged particle signal,
• wherein the charged particle beam device further comprises:
• a temperature regulation unit for controlling a temperature of the semiconductor wafer, and
• a measurement unit for acquiring, in a contactless manner, an observation indication of the wafer that is necessary for controlling the temperature regulation unit,
• wherein the measurement unit includes an information processing unit for performing predetermined processing on pixel data constituting an image of the wafer,
• wherein a position deviation at a specific reference position on the wafer is calculated from the pixel data by the information processing unit, and
• wherein the temperature regulation unit is controlled by using information of the calculated deviation.