Charged particle beam lens and charged particle beam exposure apparatus

A charged particle beam exposure apparatus comprising:

• a beam generating unit for generating a charged particle beam;
• a blanker array for controlling at least one of one and off of the charged particle beam in accordance with a drawing pattern;
• an objective lens for causing the charged particle beam that has passed through the blanker array to form an image on a wafer;
• and
• a control unit for controlling the beam generating unit, the blanker array, and the objective lens,
• wherein:
• (i) the objective lens comprises a first electrode on a downstream side and a second electrode on an upstream side in a travelling direction of the charged particle beam,
• (ii) the first electrode and the second electrode are spaced away from each other by a distance defining member provided therebetween,
• (iii) the objective lens has a gap formed therein surrounded by the first electrode, the second electrode, and the distance defining member,
• (iv) each of the first electrode and the second electrode has a first through hole formed therein, through which the charged particle beam passes,
• (v) the second electrode has a second through hole formed therein, through which the charged particle beam does not pass,
• (vi) both the first through holes and the second through holes communicate to the gap, and
• (vii) a third through hole passes through the first electrode and the second electrode in the travelling direction of the charged particle beam, the third through hole being provided outside of the gap and not communicating to the gap.