Method of inspecting pattern and inspecting instrument

An electron beam apparatus equipped with a review function of a sample, comprising:

• a scanning electron microscope to obtain a signal of secondary electrons or reflected electrons generated by irradiation of a sample with an electron beam;
• an information processing apparatus configured to:
• receive positional information of a defect on the sample from a from different inspection apparatus that incorporates an electron beam inspection apparatus, the positional information being obtained by comparing patterns and an inspection condition of the different inspection apparatus, and
• to process the signal from the scanning electron microscope;
• and
• storage means for storing a plurality of images based on the signal from the scanning electron microscope and corresponding to the positional information of the defect, and for storing information for classifying the plurality images by a type of defect including electrical defect and figure defect;
• wherein the information processing apparatus displays the inspection condition of the different inspection apparatus on a graphical user interface, retrieves any of the plurality of images with higher resolution than an image including the defect that the different inspection apparatus retrieves by selecting a review mode from a plurality of review modes including a voltage contrast mode based on the displayed inspection condition of the different inspection apparatus, and classifies the retrieved images depending on the types of defect selected from the group consisting of electrical defect and figure defect.