Nanostructured organosilicates from thermally curable block copolymers
AssigneeInternational Business Machines Corporation
InventorsKrishna S. Bajjuri, Qiu Dai, Alshakim Nelson, Jitendra S. Rathore
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Abstract
Provided are inorganic-organic block copolymers that self assemble without the addition of a precursor. The inorganic block of the polymers includes silicon and the organic block may be any organic polymer. The inorganic-organic block copolymers self assemble to form a material in which the inorganic polymer block may be crosslinked to produce an organosilicate and/or silica matrix, and further thermal curing of the matrix results in the formation of a porous nanostructured film.
Claims25
A method of preparing a nanostructured organosilicate matrix comprising the steps of:
- (a) preparing a self-assembled material from a block copolymer comprising (i) at least one of an alpha-, beta-, and gamma-substituted polysiloxane polymer block, and (ii) an organic polymer block, wherein the polysiloxane polymer block directly transforms into an organosilicate and/or silica matrix comprising an inorganic domain and an organic domain;
- and
- (b) curing the self-assembled material at a temperature in the range of 20° C. to 450° C. to crosslink the inorganic domain to form a nanostructured organosilicate matrix.
A composition comprising a block copolymer comprising a polysiloxane-containing inorganic polymer block and an organic polymer block, wherein the polysiloxane-containing inorganic polymer block comprises a monomer repeat unit selected from the group consisting of structure (I) and structure (II):
- wherein
- R1 is independently alkylene;
- R2 is selected from the group consisting of C1-C20 alkyl, cycloalkyl, aryl, and aromatic;
- and
- X is independently an electronegative group.
A composition comprising a block copolymer comprising a polysiloxane-containing inorganic polymer block and an organic polymer block, wherein the polysiloxane-containing inorganic polymer block comprises a monomer repeat unit selected from the group consisting of structure (III) and structure (IV):
- wherein
- R3 is selected from the group consisting of C1-C20 alkyl, cycloalkyl, aryl, and aromatic;
- and
- R4 is independently selected from C1-C20 alkyl, cycloalkyl, aryl, hydroxy alkyl, alkylamine, alkylamide, and alkylurea.
A composition comprising a block copolymer comprising a polysiloxane-containing inorganic polymer block and an organic polymer block, wherein the polysiloxane-containing inorganic polymer block comprises a monomer repeat unit selected from the group consisting of structure (V) and structure (VI):
- wherein R5 is selected from the group consisting of alkyl, cycloalkyl, aryl, and aromatic.
A composition comprising a block copolymer comprising a polysiloxane-containing inorganic polymer block and an organic polymer block, wherein the polysiloxane-containing inorganic polymer block comprises a monomer repeat unit selected from the group consisting of structure (VII) and structure (VIII):
- wherein R6 is selected from the group consisting of alkyl, cycloalkyl, aryl, and aromatic.
Dependencies are inferred from the claim text.