Polysilazane-containing composition capable of forming a dense siliceous film
AssigneeAZ Electronic Materials USA Corp.
InventorYuki Ozaki
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Abstract
The present invention provides a polysilazane-containing composition capable of forming a dense siliceous film more rapidly and at a lower temperature than known polysilazane-containing composition. In a process for forming the siliceous film, the composition comprising a polysilazane compound, a particular amine compound and a solvent is coated on a substrate and converted into a siliceous substance. The particular amine compound preferably contains two amine groups separated from each other at the distance corresponding to five C—C bonds or more, and the amine groups preferably have hydrocarbon substituent groups.
Claims14
A polysilazane-containing composition comprising
- a polysilazane compound,
- an amine compound represented by the following formula (A):
- (wherein
- each RA independently represents hydrogen or a hydrocarbon group of C1 to C3 under the condition that two RAs connecting to the same nitrogen atom are not hydrogen atoms at the same time,
- each of L1 and L2 independently represents, CH2, —NRA1— (in which RA1 is hydrogen or a hydrocarbon group of C1 to C4) or —O—, where at least one of L1 and L2 is chosen from CH2
- each of p1 and p3 is independently an integer of 0 to 4, and
- p2 is an integer of 1 to 4),
- and, a solvent capable of dissolving said polysilazane compound and said amine compound, where the solvent is selected from a ketone whose vapor pressure at 20° C. is 0.8 kPa or less.
Dependencies are inferred from the claim text.