Multipurpose acidic, organic solvent based microelectronic cleaning composition
AssigneeAvantor Performance Materials, Inc.
InventorsChien-Pin S. Hsu, Glenn Westwood, William R. Gemmill
Life of this patent
Estimating the term…
Abstract
A cleaning composition for cleaning microelectronic or nanoelectronic devices, the cleaning composition having HF as the sole acid and sole fluoride compound in the composition, at least one primary solvent selected from the group consisting of sulfones and selenones, at least one polyhydroxyl alkyl or aryl alcohol co-solvent having metal ion complexing or binding sites, and water, and optionally at least one phosphonic acid corrosion inhibitor compound and the is free of amines, bases and other salts.
Claims6
A cleaning composition for cleaning microelectronic or nanoelectronic devices, the cleaning composition comprising:
- About 0.2% HF,
- at least one primary solvent selected from the group consisting of sulfones and selenones,
- wherein said primary solvent comprises about 36.4% sulfolane,
- at least one polyhydroxyl alkyl or aryl alcohol co-solvent having metal ion complexing or binding sites, wherein said co-solvent comprises about 45.4% ethylene glycol,
- about 18% water, and
- optionally at least one phosphonic acid corrosion inhibitor compound,
- said cleaning composition being free of, bases, and other salts, and has a pH ≦5.5, and
- wherein the percentages are by weight based on the total weight of the composition.
Dependencies are inferred from the claim text.