Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition
AssigneeFUJIFILM Corporation
InventorsShuhei Yamaguchi, Akinori Shibuya, Shohei Kataoka
Life of this patent
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Abstract
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that when exposed to actinic rays or radiation, generates any of the acids of general formula (II) below and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid. (The characters used in general formula (I) have the meanings mentioned in the description.)
Claims18
An actinic-ray- or radiation-sensitive resin composition comprising a compound (A) that when exposed to actinic rays or radiation, generates any of the acids of general formula (II) below and a resin (B) whose rate of dissolution into an alkali developer is increased by the action of an acid,
- wherein A represents a nitrogen atom or a carbon atom, R1 represents a monovalent organic group containing a fluorine atom in a ratio satisfying the relationship (mass of all fluorine atoms contained)/(mass of all atoms contained)≦0.35, and R2 represents a group containing an electron withdrawing group,
- provided that when A is a nitrogen atom, n+m=2, n=1 or 2, and m=0 or 1, and that when A is a carbon atom, n+m=3, n is an integer of 1 to 3, and m is an integer of 0 to 2,
- provided that when n is 2 or greater, the two or more R1s may be identical to or different from each other, and R1s may be bonded to each other to thereby form a ring, and that when R1s are bonded to each other to thereby form a ring, the above ratio of fluorine atom contained in R1 refers to the ratio of fluorine atom contained in a bivalent group formed by the bonding of two R1s, and
- provided that when m is 1 or greater, R1 and R2 may be bonded to each other to thereby form a ring, and that in this instance, the above ratio of fluorine atom contained in R1 refers to the ratio of fluorine atom contained in a bivalent group formed by the mutual bonding of R1 and R2.
Compounds of general formula (I) below,
- wherein A represents a nitrogen atom or a carbon atom;
- R1 represents a monovalent organic group containing a fluorine atom in a ratio satisfying the relationship (mass of all fluorine atoms contained)/(mass of all atoms contained)≦0.35;
- R2 represents a group containing an electron withdrawing group;
- and M+ represents an organic counter ion,
- provided that when A is a nitrogen atom, n+m=2, n=1 or 2, and m=0 or 1, and that when A is a carbon atom, n+m=3, n is an integer of 1 to 3, and m is an integer of 0 to 2,
- provided that when n is 2 or greater, the two or more R1s may be identical to or different from each other, and R1s may be bonded to each other to thereby form a ring, and that when R1s are bonded to each other to thereby form a ring, the above ratio of fluorine atom contained in R1 refers to the ratio of fluorine atom contained in a bivalent group formed by the bonding of two R1s, and
- provided that when m is 1 or greater, R1 and R2 may be bonded to each other to thereby form a ring, and that in this instance, the above ratio of fluorine atom contained in R1 refers to the ratio of fluorine atom contained in a bivalent group formed by the mutual bonding of R1 and R2.
Compounds of general formula (V) below,
- wherein A represents a nitrogen atom or a carbon atom;
- R1 represents a monovalent organic group containing a flourine atom in a ratio satisfying the relationship (mass of all fluorine atoms contained)/(mass of all atoms contained)≦0.35;
- R2 represents a group containing an electron withdrawing group;
- and D+ represents a metal ion or an ammonium ion,
- provided that when A is a nitrogen atom, n+m=2, n=1 or 2, and m=0 or 1, and that when A is a carbon atom, n+m=3, n is an integer of 1 to 3, and m is an integer of 0 to 2,
- provided that when n is 2 or greater, the two or more R1s may be identical to or different from each other, and R1s may be bonded to each other to thereby form a ring, and that when R1s are bonded to each other to thereby form a ring, the above ratio of fluorine atom contained in R1 refers to the ratio of fluorine atom contained in a bivalent group formed by the bonding of two R1s, and
- provided that when m is 1 or greater, R1 and R2 may be bonded to each other to thereby form a ring, and that in this instance, the above ratio of fluorine atom contained in R1 refers to the ratio of fluorine atom contained in a bivalent group formed by the mutual bonding of R1 and R2.
Dependencies are inferred from the claim text.