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US 8,557,498 B2Granted
Photosensitive resin composition
AssigneeAsahi Kasei E-Materials Corporation
InventorTomohiro Yorisue
Life of this patent
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Abstract
A photosensitive resin composition is used that comprises a photosensitive silicone having a styryl group as a photosensitive group, and a photopolymerization initiator having a specific structure. As a result, a photosensitive resin composition capable of being cured in air by photopolymerization that is preferable for use as a buffer coat material or rewiring layer of an LSI chip, a method for forming a cured relief pattern using this photosensitive resin composition, and a semiconductor device comprising the cured relief pattern are provided.
Claims5
A photosensitive resin composition, comprising:
- (A) 100 parts by weight of a photosensitive silicon compound described in (I) below, and (B) 0.1 to 20 parts by weight of a photopolymerization initiator described in (II) below:
- (I) the photosensitive silicon compound is obtained by adding to at least one type of silanol compound represented by the following formula (a) (to be referred to as component (a)), a component (b) in the form of at least one type of compound selected from the group consisting of compounds represented by the following general formulas (b1), (b2), (b3) and (b4) (to be referred to as components (b1), (b2), (b3) and (b4)) containing the component (b1) at 10 to 100% in terms of the number of moles thereof, at a ratio of component (a) to component (b) of 40/60 mol % to 60/40 mol %, followed by condensing using a catalyst without adding water;
- wherein, the number of moles of component (b)=(number of moles of component (b1)+the number of moles of component (b2))+(3/2×number of moles of component (b3))+(2×number of moles of component (b4));
- R12Si(OH)2 (a)
- (wherein, R1 represents at least one type of group selected from the group consisting of a C1-C12 linear alkyl group, C3-C12 branched alkyl group, C3-C12 cyclic alkyl group, C6-C12 aryl group, C7-C12 alkylaryl group and C7-C12 arylalkyl group, and R1 may be the same or different);
- R2aR3bSiX4-a-b (b1)
- (wherein, R2 represents a substituent represented by the following formula (1) or (2), R3 represents a C1-C12 hydrocarbon group, X represents a C1-C12 alkoxy group, a represents an integer selected from 1 and 2, b represents an integer selected from 0 and 1, a+b does not exceed 2, and in the case a is 2, R2 may be the same or different);
- (wherein, Y represents a C1-C12 hydrocarbon group or a C1-C12 hydrocarbon group containing one or more types of elements selected from the group consisting of oxygen, nitrogen, fluorine and sulfur);
- (wherein, R4 represents one type of group selected from the group consisting of a linear C1-C12 alkyl group, C3-C12 branched alkyl group, C3-C12 cyclic alkyl group, C6-C12 aryl group, C7-C12 alkylaryl group, C7-C12 arylalkyl group, C2-C7 epoxy group or unsaturated double bond-containing hydrocarbon group, C1-C12 amino group-, ureido group- or mercapto group-containing hydrocarbon group, and C1-C12 fluorine-containing hydrocarbon group, R3 represents a C1-C12 hydrocarbon group, X represents a C1-C12 alkoxy group, a represents an integer selected from 1 and 2, b represents an integer selected from 0 and 1, a+b does not exceed 2, and in the case a is 2, R4 may be the same or different);
- M1X3 (b3)
- (wherein, M1 represents boron or aluminum, and X represents a C1-C12 alkoxy group);
- M2X4 (b4)
- (wherein, M2 represents silicon, germanium, titanium or zirconium, and X represents a C1-C12 alkoxy group);
- and,
- (II) at least one type of photopolymerization initiator having a phosphine oxide group represented by the following formula (e):
- (wherein, m represents an integer selected from 1 and 2, R5 and R6 respectively and independently represent one type of group selected from the group consisting of a C1-C12 alkyl group, C6-C12 aryl group, C7-C12 alkylaryl group and C1-C3 alkoxy or halogen-substituted aryl group, and in the case of a plurality of R5 and R6, R5 and R6 may be the same or different).
13 more elements
Dependencies are inferred from the claim text.