Coated member
AssigneeTungaloy Corporation
InventorsMiho Shibata, Katsuhisa Ohtomo
Life of this patent
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Abstract
A coated member includes a base material and a coating film formed on the surface thereof. At least one layer in the coating film is a hard film of a cubic metal compound including at least one element selected from the group consisting of the group 4 elements (Ti, Zr, Hf, etc.), group 5 elements (V, Nb, Ta, etc.) and group 6 elements (Cr, Mo, W, etc.) of the periodic table, Al, Si, B, Y and Mn together with at least one element selected from the group consisting of C, N and O. In the pole figure for the face (111) of the hard film, the X-ray intensity distribution in the α-axis shows the maximum intensity in the α-angle range of 50-65°. In the pole figure for the face (200), the X-ray intensity distribution in the α-axis shows the maximum intensity in the α-angle range of 60-80°.
Claims20
A coated member comprising a substrate and a coating coated on the surface of the substrate, wherein:
- at least one layer of the coating is a hard film comprising a cubic metallic compound which comprises:
- at least one element selected from the elements of Groups 4, 5 and 6 of the Periodic Table, Al, Si, B, Y and Mn, and
- at least one element selected from C, N and O, and
- an X-ray intensity distribution of an α axis in a pole figure for a (111) plane of the hard film has a maximum intensity in an α angle range of 50 to 65°, and
- an X-ray intensity distribution of an α axis in a pole figure for a (200) plane of the hard film has a maximum intensity in an α angle range of 60 to 80°.
A method of coating a cutting tool substrate with a hard film to form a coated cutting tool whose X-ray intensity distribution of an α axis in a pole figure for a (111) plane of the hard film has a maximum intensity in an α angle range of 50 to 65°, and whose X-ray intensity distribution of an α axis in a pole figure for a (200) plane of the hard film has a maximum intensity in an α angle range of 60 to 80°, the method comprising:
- (a) placing the substrate in a device;
- (b) heating the substrate to a first temperature which is 500 to 750° C. and subjecting the substrate to an Ar gas bombardment;
- (c) after subjecting the substrate to Ar gas bombardment, introducing into the device Ar, N2, O2, CH4, C2H2 or a mixed gas thereof and adjusting a pressure in the device to 2 to 5 Pa
- (d) initially coating the substrate by applying, for a first time period, a direct current bias voltage of −20 to −70V and an arc discharge current of 80 to 180 A;
- (e) lowering the substrate temperature to a second temperature which is 450 to 700° C. while maintaining the pressure and changing the substrate bias voltage to −80 to −180V;
- (f) further coating the substrate by applying, for second time period, a substrate bias voltage of −80 to −180V and an arc discharge current of 130 to 180 A;
- wherein:
- the first and second time periods are selected such that 3 to 15% of a thickness of the hard film is applied during step (d) and about 85 to 97% of the thickness of the hard film is applied during step (f).
Dependencies are inferred from the claim text.