Electroluminescent display device

A method of manufacturing a color electroluminescent display device, comprising:

• providing a substrate comprising thin film transistors formed thereon;
• forming a first resist layer of a first color on the substrate;
• positioning a first mask having a first opening over the first resist layer;
• forming a first color filter by photolithographic patterning of the first resist layer using the first mask;
• forming a second resist layer of a second color on the first color filter and the substrate;
• positioning a second mask having a second opening over the second resist layer;
• forming a second color filter by photolithographic patterning of the second resist layer using the second mask;
• forming a first anode layer directly on the first color filter and a second anode layer directly on the second color filter;
• forming an electroluminescent layer on the first and second anode layers;
• and
• forming a cathode layer on the electroluminescent layer,
• wherein the first mask is positioned so that an area of the first resist layer larger than an area of the first opening is exposed during the photolithographic patterning of the first resist layer so that the first color filter has a tapered end portion,
• the second mask is positioned so that an area of the second resist layer larger than an area of the second opening is exposed during the photolithographic patterning of the second resist layer so that the second color filter has a tapered end portion that is on the tapered end portion of the first color filter, and a vertical distance between a top of the tapered end portion of the second color filter at a peak height position and a top of the first color filter at a position that is a vertical projection of the peak height position is smaller than a thickness of the second color filter at an area where the second color filter does not cover the first color filter.