Polyurethane foam and polishing pad
AssigneesToyo Polymer Co., Ltd., Nitta Haas Incorporated
InventorsMichiro Goto, Kazuo Takemoto, Nobuyuki Ooshima, Shin-ichi Haba, Kouichi Yoshida, Norio Kawai
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AssigneesToyo Polymer Co., Ltd., Nitta Haas Incorporated
InventorsMichiro Goto, Kazuo Takemoto, Nobuyuki Ooshima, Shin-ichi Haba, Kouichi Yoshida, Norio Kawai
Estimating the term…
The present invention provides a polyurethane foam, which, despite having a low specific gravity, has a hardness and an elasticity favorable for a polishing pad, and a polishing pad made using the polyurethane foam. The polyurethane foam is obtained by reacting a blend composition containing (A) a polyisocyanate, (B) a polyol, (C) a chain extender with a molecular weight of equal to or smaller than 400, and (D) water, and in the blend composition, MDI is blended as a main component of the component (A) and a blending amount of the MDI is 45 to 70 parts by weight when a total weight of the respective components (A), (B), and (C) is taken as 100 parts by weight.
A polishing pad made of a polyurethane foam obtained by reacting a blend composition consisting of (A) a polyisocyanate, (B) a polyol, (C) a polyvalent alcohol-based chain extender with a molecular weight of equal to or smaller than 400, and (D) water, and optionally one or more additives,
Dependencies are inferred from the claim text.