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US 8,553,227 B2Granted
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
AssigneeASML Netherlands B.V.
InventorCvetanka Jordanoska
Life of this patent
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Abstract
An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent. The radiation that is reflected off the substrate is radially polarized.
Claims17
A scatterometer, comprising:
- a radiation source configured to provide a radiation beam;
- a high numerical aperture lens configured to direct the radiation beam onto a substrate;
- and
- a detector configured to detect an angle-resolved spectrum of the radiation beam reflected at a plurality of angles from a surface of the substrate,
- wherein the radiation source is configured to radially polarize the radiation beam.
2 more elements
A method, comprising
- generating a pattern for printing onto a substrate through patterning a radially polarized radiation beam;
- and
- measuring, in the pupil plane of a high numerical aperture lens, a reflected spectrum of the pattern.
A lithographic apparatus comprising:
- an illumination optical system configured to illuminate a pattern;
- a projection optical system configured to project an image of the pattern on to a substrate;
- and
- an angularly resolved scatterometer configured to measure a property of the substrate, the scatterometer comprising,
- a radiation source configured to provide a radiation beam,
- a high numerical aperture lens configured to direct the radiation beam on the substrate, and
- a detector configured to detect an angle-resolved spectrum of the radiation beam reflected at a plurality of angles from a surface of the substrate,
- wherein the radiation source is configured to radially polarize the radiation beam.
5 more elements
A lithographic cell, comprising:
- a coater configured to coat substrates with a radiation sensitive layer;
- a lithographic apparatus configured to expose images onto the radiation sensitive layer of substrates coated by the coater;
- a developer configured to develop images exposed by the lithographic apparatus;
- and
- an angularly resolved scatterometer configured to measure a property of a substrate, the scatterometer comprising,
- a radiation source configured to provide a radiation beam,
- a high numerical aperture lens, and
- a detector configured to detect an angle-resolved spectrum of the radiation beam reflected at a plurality of angles from a surface of the substrate,
- wherein the radiation source is configured to radially polarize the radiation beam.
6 more elements
A device manufacturing method, comprising:
- forming a pattern on a substrate using a lithographic apparatus;
- and
- determining a value related to a parameter of the pattern printed by:
- providing a radiation beam;
- generating a pattern for printing onto the substrate;
- and
- measuring, in the pupil plane of a high numerical aperture lens, a reflected spectrum of the pattern, the reflected spectrum being created by the reflection of a radially polarized radiation beam from the pattern on the substrate.
4 more elements
Dependencies are inferred from the claim text.