Stage drive method and stage unit, exposure apparatus, and device manufacturing method
AssigneeNikon Corporation
InventorYuichi Shibazaki
Life of this patent
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AssigneeNikon Corporation
InventorYuichi Shibazaki
Estimating the term…
When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage is positioned at the first area, both stages are simultaneously driven while a state where both stages are close together in the X-axis direction is maintained. Therefore, it becomes possible to make a transition from the first state to the second state in a state where liquid is supplied in the space between the projection optical system and the specific stage directly under the projection optical system. Accordingly, the time from the completion of exposure operation on one stage side until the exposure operation begins on the other stage side can be reduced, which allows processing with high throughput. Further, because the liquid can constantly exist on the image plane side of the projection optical system, generation of water marks on optical members of the projection optical system on the image plane side is prevented.
An exposure method of exposing a substrate via a projection optical system and a liquid, the method comprising:
An exposure method of exposing a substrate via a projection optical system and a liquid, the method comprising:
An exposure method of exposing a substrate via a projection optical system and a liquid, the method comprising:
Dependencies are inferred from the claim text.