Projection objective for microlithography
AssigneeCarl Zeiss SMT GmbH
InventorsJens Kugler, Tilman Schwertner
Life of this patent
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Abstract
An optical system includes an optical element having adjusting elements. The optical element is connected to a rotatable carrying ring via at least one connecting member arranged on the carrying ring directly or via one or a plurality of intermediate elements to the optical element. The rotatable carrying ring is borne in a manner freely rotatable about an axis relative to a fixed outer mount or the optical element via a rotating device. The outer mount, the rotatable carrying ring and the connecting members are constructed as rotatable kinematics in the form of parallel kinematics.
Claims30
An optical system, comprising:
- an optical element comprising adjusting elements;
- a rotatable carrying ring;
- at least three connecting members arranged on the rotatable carrying ring directly or via at least one intermediate element, the at least three connecting members connecting the rotatable carrying ring to the optical element;
- a fixed outer mount;
- a rotating device;
- and
- an isostatic bearing that connects the rotatable carrying ring to the fixed outer mount,
- wherein:
- via the rotating device, the rotatable carrying ring is freely rotatable about at least one axis relative to the fixed outer mount or the optical element;
- and
- the fixed outer mount, the rotatable carrying ring and the at least three connecting members are rotatable kinematics in the form of parallel kinematics.
An optical system, comprising:
- an optical element comprising adjusting elements;
- a rotatable carrying ring;
- at least three bipods arranged on the rotatable carrying ring directly or via at least one intermediate element, the at least three bipods connecting the rotatable carrying ring to the optical element;
- a fixed outer mount;
- and
- a rotating device;
- wherein:
- the bipods are each connected in a head region to attachments arranged on a circumference of the optical element;
- the rotatable carrying ring is freely rotatable about at least one axis relative to the fixed outer mount or the optical element via a rotating device;
- and
- the fixed outer mount, the rotatable carrying ring and the at least three connecting members are rotatable kinematics in the form of parallel kinematics.
An apparatus, comprising:
- an illumination device;
- and
- a projection objective, comprising:
- an optical element comprising adjusting elements;
- a rotatable carrying ring;
- at least three connecting members arranged on the rotatable carrying ring directly or via at least one intermediate element, the at least three connecting members connecting the rotatable carrying ring to the optical element;
- a fixed outer mount;
- a rotating device;
- and
- an isostatic bearing that connects the rotatable carrying ring to the fixed outer mount,
- wherein:
- the apparatus is a projection exposure apparatus for microlithography;
- the rotatable carrying ring is freely rotatable about at least one axis relative to the fixed outer mount or the optical element via a rotating device;
- and
- the fixed outer mount, the rotatable carrying ring and the at least three connecting members are rotatable kinematics in the form of parallel kinematics.
Dependencies are inferred from the claim text.