Manufacturing method of an array substrate including a four step process

A method of manufacturing an array substrate, comprising:

• Step 1.00, depositing a transparent conductive film and a gate metal film on a substrate, and forming a pixel electrode, a gate electrode, and a gate line with a first patterning process, wherein the gate metal film over the pixel electrode is removed in the first patterning process;
• Step 2.00, depositing, successively, a gate insulating film, a semiconductor film, and a doped semiconductor film on the substrate after step 1.00, and forming a semiconductor layer and a doped semiconductor layer with a second patterning process;
• Step 3.00, depositing a source/drain metal film on the substrate after step 2.00, and forming a data line, a source electrode, and a drain electrode with a third patterning process, the source electrode being electrically connected with the data line, and the drain electrode being electrically connected with the pixel electrode;
• and
• Step 4.00, forming a planarization film on the substrate after step 3.00, depositing a reflective layer film on the planarization film and forming a reflective layer with a fourth patterning process, the reflective layer being disposed in a reflective region in a pixel region defined by crossing of the gate line and the data line,
• wherein, in the Step 3.00, when forming the data line, the source electrode and the drain electrode, a reflective structure is formed in the reflective region,
• wherein, the reflective structure is formed below the reflective layer through the planarization film, and
• wherein, the reflective layer is electrically isolated from the drain electrode.