Variable resistance memory device and method of forming the same
AssigneeSamsung Electronics Co., Ltd.
InventorsJeonghee Park, Hideki Horii, Hyeyoung Park, Jin Ho Oh, Hyun-Suk Kwon
Life of this patent
Estimating the term…
Loading patent…
AssigneeSamsung Electronics Co., Ltd.
InventorsJeonghee Park, Hideki Horii, Hyeyoung Park, Jin Ho Oh, Hyun-Suk Kwon
Estimating the term…
Provided are a variable resistance memory device and a method of forming the same. The variable resistance memory device may include a substrate, a plurality of bottom electrodes on the substrate, and a first interlayer insulating layer including a trench formed therein. The trench exposes the bottom electrodes and extends in a first direction. The variable resistance memory device further includes a top electrode provided on the first interlayer insulating layer and extending in a second direction crossing the first direction and a plurality of variable resistance patterns provided in the trench and having sidewalls aligned with a sidewall of the top electrode.
A variable resistance memory device comprising:
A variable resistance memory device, comprising:
A variable resistance memory device, comprising:
Dependencies are inferred from the claim text.