Charged particle beam writing apparatus and charged particle beam writing method

A charged particle beam writing apparatus comprising:

• a gradient calculation unit configured to calculate a gradient of a convolution amount that is calculated from a convolution operation between an area density and a distribution function;
• a small influence radius phenomenon dose correction coefficient calculation unit configured to calculate a small influence radius phenomenon dose correction coefficient that corrects for dimension variation due to a phenomenon whose influence radius is on an order of microns or less, by using the convolution amount and the gradient;
• a first proximity effect dose correction coefficient calculation unit configured to calculate a first proximity effect dose correction coefficient that corrects for dimension variation due to a proximity effect, by using a first function depending on the small influence radius phenomenon dose correction coefficient;
• a dose calculation unit configured to calculate a dose by using the first proximity effect dose correction coefficient and the small influence radius phenomenon dose correction coefficient;
• and
• a writing unit configured to write a figure pattern concerned on a target object, based on the dose, by using a charged particle beam.