Method for adjusting imaging magnification and charged particle beam apparatus

An apparatus for setting field-of-view conditions of a charged particle beam system, said apparatus comprising;

• a control condition setting unit for a charged particle beam, said control condition setting unit being configured to determine a size of field of view of said charged particle beam system on graphic data that is obtained on the basis of design data of a semiconductor device,
• wherein said control condition setting unit is further configured to
• obtain a first distance between a line segment of a pattern on the graphic data which is first positioned in a first direction from a reference point set on the graphic data, and a line segment of the pattern which is first positioned in a second direction from the reference point, the first direction and the second direction being opposite each other,
• obtain a second distance between a line segment of the pattern which is first positioned in a third direction from the reference point, and a line segment of the pattern which is first positioned in a fourth direction from the reference point, the third direction being different from the first and second directions, and the third direction and the fourth direction being opposite to each other,
• obtain a third distance between two vertexes of said pattern that are the nearest from said reference point,
• perform a comparison between said first distance, said second distance, and said third distance, and
• determine a size of field of view so as to include said reference point and said two intersection points or said two vertexes of said pattern corresponding to the shortest distance of said three distances, and so as to set a distance between said two intersection points or said two vertexes of said pattern corresponding to the shortest distance to a distance within said field of view in accordance with a ratio relative to said size of field of view.

An apparatus for setting field-of-view conditions of a charged particle beam system, said apparatus comprising:

• a control condition setting unit for a charged particle beam, said control condition setting unit being configured to determine a size of field of view of said charged particle beam system on graphic data that is obtained on the basis of design data of a semiconductor device,
• wherein said control condition setting unit is further configured to
• obtain a first distance between two vertexes of a pattern on said graphic data which are the nearest from a reference point on said graphic data,
• obtain a second distance between a point on a line segement on the pattern which is the nearest from the reference point and one of the two vertexes of the pattern,
• obtain a third distance between the point on said line segments and the other of said two vertexes of said pattern,
• perform a comparison between said first, said second and said third distances, and
• determine a size of field of view so as to include said reference point and the two vertexes or the point and the vertex corresponding the shortest distance of said three distances, and so as to set a distance between the two vertexe or between the point and the vertex corresponding to the shortest distance to such that said shorter distance is within said field of view and is provided in accordance with a ratio relative to said size of field of view.