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US 8,552,334 B2Granted
Adjustable gap capacitively coupled RF plasma reactor including lateral bellows and non-contact particle seal
AssigneeLam Research Corporation
InventorsJames E. Tappan, Scott Jeffery Stevenot
Life of this patent
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Abstract
A plasma processing chamber includes a cantilever assembly and at least one vacuum isolation member configured to neutralize atmospheric load. The chamber includes a wall surrounding an interior region and having an opening formed therein. A cantilever assembly includes a substrate support for supporting a substrate within the chamber. The cantilever assembly extends through the opening such that a portion is located outside the chamber. The chamber includes an actuation mechanism operative to move the cantilever assembly relative to the wall.
Claims17
A plasma processing apparatus, comprising:
- a chamber comprising a sidewall separating the interior of the chamber into first and second regions, the sidewall having an opening therein providing fluid communication between the first and second regions;
- a cantilever assembly comprising an arm unit extending horizontally through the opening such that a first end is in the first region and a second end is in the second region, a substrate support being located on an upper portion of the first end;
- an actuation mechanism coupled to the second end of the arm unit and operative to move the cantilever assembly in a vertical direction;
- and
- a lateral bellows arrangement providing a transversely movable vacuum seal between the arm unit and the sidewall around the periphery of the opening.
2 more elements
Dependencies are inferred from the claim text.