# US 8,543,557 B2 · Evolution of library data sets

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- Number: US 8,543,557 B2
- Document ID: US8543557B2
- Status: Granted
- Kind: B2
- Application number: 11/096,845
- Filed: 2005-04-01
- Published: 2005-08-18
- Granted: 2013-09-24
- Earliest claimed: 2001-10-23
- Assignees: KLA-Tencor Corporation
- Applicants: David M. Aikens; Youxian Wen; Walter Lee Smith
- Inventors: David M. Aikens; Youxian Wen; Walter Lee Smith
- Web page: https://patentgrep.com/patent/US8543557B2

## CPC

- G01N 21/47: Scattering, i.e. diffuse reflection (G01N21/25, G01N21/41 take precedence {G01N21/55 takes precedence})
- G01N 21/956: Inspecting patterns on the surface of objects {(contactless testing of electronic circuits G01R31/308; testing currency G07D; manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20)}
- G01N 21/9501: {Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20)}
- Y10S 707/99936: Pattern matching access
- Y10S 707/99943: Generating database or data structure, e.g. via user interface
- G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q)
- Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

## Abstract

An optical metrology includes a library, a metrology tool and a library evolution tool. The library is generated to include a series of predicted measurements. Each predicted measurement is intended to match the measurements that a metrology device would record when analyzing a corresponding physical structure. The metrology tool compares its empirical measurements to the predicted measurements in the library. If a match is found, the metrology tool extracts a description of the corresponding physical structure from the library. The library evolution tool operates to improve the efficiency of the library. To make these improvements, the library evolution tool statistically analyzes the usage pattern of the library. Based on this analysis, the library evolution tool increases the resolution of commonly used portions of the library. The library evolution tool may also optionally reduce the resolution of less used portions of the library.

## Claims

### Claim 1

An optical metrology system that comprises:
a plurality of separate optical metrology tools;
a shared library connected to said metrology tools and including a series of predicted measurement sets, each predicted measurement set corresponding to the empirical measurement sets that the metrology tools would record for a variation of a physical structure;
an analysis program configured to search the shared library to locate predicted measurement sets that match the empirical measurement sets gathered by the metrology tools, the analysis program also configured to generate a usage pattern for the shared library, the usage pattern identifying the most common searches performed on the shared library; and
a library evolution tool configured to add one or more new predicted measurement sets to the library to increase the number of predicted measurement sets within the shared library to correspond with the usage pattern so that upon a subsequent search of the library the likelihood of locating a predicted measurement set that better matches an empirically obtained measurement set is increased.

### Claim 2 (depends on 1)

An optical metrology system as recited in claim 1 that further comprises a local library associated with one of the optical metrology tools, the local library supplementing the shared library by including the predicted measurement sets most used by the associated optical metrology tool.

### Claim 3 (depends on 2)

An optical metrology system as recited in claim 2, wherein the library evolution tool is further configured to reconfigure the local library to correspond with a usage pattern for the local library.

### Claim 4

A method of analyzing samples with a network including a first optical metrology tool and a second, separate optical metrology tool, the method comprising the steps of:
generating a first local library associated with the first metrology tool and a second, separate local library associated with the second metrology tool, each library including a series of predicted measurement sets, each predicted measurement set corresponding to the empirical measurement sets that the associated metrology tool would record for a variation of a physical structure;
independently evolving both the first and second local libraries based on the respective usage of the first and second metrology tools;
searching the first local library to locate predicted measurement sets that match empirical measurement sets gathered by the first metrology tool; and
reconfiguring the first metrology tool to use the second local library if the second local library includes predicted measurements sets more closely matching the empirical measurement sets gathered by the first metrology tool.