# US 8,542,341 B2 · Exposure apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,542,341 B2 - Document ID: US8542341B2 - Status: Granted - Kind: B2 - Application number: 12/232,967 - Filed: 2008-09-26 - Published: 2009-01-29 - Granted: 2013-09-24 - Earliest claimed: 2005-01-12 - Assignees: ASML Netherlands B.V. - Applicants: Arjen Boogaard; Timotheus Franciscus Sengers; Wilhelmus Sebastianus Marcus Maria Ketelaars; Carolus Ida Maria Antonius Spee - Inventors: Arjen Boogaard; Timotheus Franciscus Sengers; Wilhelmus Sebastianus Marcus Maria Ketelaars; Carolus Ida Maria Antonius Spee - Web page: https://patentgrep.com/patent/US8542341B2 ## CPC - G03F 7/70058: {Mask illumination systems} - G03B 27/42: for automatic sequential copying of the same original (G03B27/34, G03B27/53 take precedence) - G03F 7/70716: {Stages} - G03F 7/7085: {Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load} - G03F 7/70916: {Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps} - G03F 7/70958: {Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - G03B: APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR (optical parts of such apparatus G02B; photosensitive materials or processes for photographic purposes G03C; apparatus for processing exposed photographic materials G03D) ## Abstract An exposure apparatus includes a radiation system configured to supply a projection beam of radiation, and a patterning device configured to pattern the projection beam according to a desired pattern. The apparatus includes a substrate table having an area configured to support a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. At least a part of the apparatus that during use of the apparatus is exposed to radiation is coated with a coating. The coating includes a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof. ## Claims ### Claim 1 An exposure apparatus comprising: a radiation system configured to supply a projection beam of radiation; a patterning device configured to pattern the projection beam according to a desired pattern; a substrate table having an area configured to support a substrate; and a projection system configured to project the patterned beam onto a target portion of the substrate; wherein a part of the projection system and/or a part of the substrate table that during use of the apparatus is exposed to radiation is coated with a hydrophilic coating, the coating comprising a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof, wherein said apparatus is an immersion lithography apparatus, and wherein an immersion liquid is provided to fill a space between the projection system and the substrate during use of the apparatus, and wherein a portion of the coating is exposed to the immersion liquid during use of the apparatus and another portion of the coating is not exposed to the immersion liquid during use of the apparatus. ### Claim 2 (depends on 1) The apparatus of claim 1, wherein said part of the substrate table includes one or more sensors selected from the group consisting of aberration sensors, radiation dose sensors, transmission image sensors, or reflective image sensors. ### Claim 3 (depends on 2) The apparatus of claim 2, wherein said part of the substrate table includes one or more transmission image sensors. ### Claim 4 (depends on 1) The apparatus of claim 1, wherein said coating comprises one or more metal oxides. ### Claim 5 (depends on 1) The apparatus of claim 1, wherein said coating comprises one or more photocatalysts. ### Claim 6 (depends on 1) The apparatus of claim 1, wherein said coating comprises one or more semiconductors. ### Claim 7 (depends on 1) The apparatus of claim 1, wherein said coating comprises titanium dioxide. ### Claim 8 (depends on 1) The apparatus of claim 1, wherein said coating comprises, relative to the total weight of said coating, at least 50 wt % titanium dioxide. ### Claim 9 (depends on 1) The apparatus of claim 1, wherein said projection beam of radiation has a wavelength in the range of 5-20 nm. ### Claim 10 (depends on 1) The apparatus of claim 1, wherein said coating has a thickness of less than 10 μm. ### Claim 11 (depends on 1) The apparatus of claim 1, wherein said coating has a thickness in the range of 50-500 nm. ### Claim 12 (depends on 1) A device manufacturing process comprising exposing a substrate to radiation with the apparatus according to claim 1. ### Claim 13 An exposure apparatus comprising: a radiation system configured to supply a projection beam of radiation; a patterning device configured to pattern the projection beam according to a desired pattern; a substrate table having an area configured to support a substrate; and a projection system configured to project the patterned beam onto a target portion of the substrate, wherein an immersion liquid is provided to fill a space between the projection system and the substrate during use of the apparatus, and wherein a part of the projection system and/or a part of the substrate table that during use of the apparatus is exposed to radiation and to the immersion liquid is coated with a photocatalytic hydrophilic coating. ### Claim 14 (depends on 13) The apparatus of claim 13, wherein the photocatalytic hydrophilic coating comprises titanium dioxide. ### Claim 15 An exposure apparatus comprising: a radiation system configured to supply a projection beam of radiation; a patterning device configured to pattern the projection beam according to a desired pattern; a substrate table having an area configured to support a substrate; and a projection system configured to project the patterned beam onto a target portion of the substrate; wherein an immersion liquid is provided to fill a space between the projection system and the substrate during use of the apparatus, and wherein a part of the substrate table that during use of the apparatus is exposed to radiation and to the immersion liquid is coated with a hydrophilic coating configured to prevent formation of droplets of the immersion liquid, the coating comprising a metal oxide, or a photocatalyst, or a semiconductor, or any combination thereof. ### Claim 16 (depends on 15) The apparatus of claim 15, wherein the coating comprises titanium dioxide. ### Claim 17 (depends on 1) The apparatus of claim 1, wherein the hydrophilicity of the coating is photo-induced. ### Claim 18 (depends on 17) The apparatus of claim 17, wherein the photo-induced hydrophilicity of the coating is reversible. ### Claim 19 (depends on 1) The apparatus of claim 1, wherein the coating has a contact angle of less than 10 degrees.