# US 8,541,739 B2 · Precession diffraction charged particle beam system > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,541,739 B2 - Document ID: US8541739B2 - Status: Granted - Kind: B2 - Application number: 13/190,871 - Filed: 2011-07-26 - Published: 2012-02-02 - Granted: 2013-09-24 - Earliest claimed: 2010-07-29 - Assignees: Carl Zeiss Microscopy GmbH - Applicants: Gerd Benner; Harald Niebel - Inventors: Gerd Benner; Harald Niebel - Web page: https://patentgrep.com/patent/US8541739B2 ## CPC - H01J 37/295: Electron or ion diffraction tubes - G01N 23/20058: Measuring diffraction of electrons, e.g. low energy electron diffraction [LEED] method or reflection high energy electron diffraction [RHEED] method - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - G01N: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing apparatus or processes other than immunoassay, involving enzymes or microorganisms C12M, C12Q) ## Abstract A charged particle beam system for performing precession diffraction includes a lens 11 for focusing a beam 5 in an object plane 9, and an objective lens 13 having a diffraction plane 27. A doublet 53 of lenses 35, 63 images the diffraction plane 27 into an intermediate diffraction plane 69 where a multipole 55 is located. A doublet 57 of lenses 65, 93 images the intermediate diffraction plane 69 into an intermediate diffraction plane 71 where a multipole 59 is located. A first deflection system 15 upstream of the object plane 9 can tilt to change an angle of incidence of the beam on the object plane. A second deflection system 37 between lenses 35 and 63 tilts the beam such that the change of the angle of incidence of the charged particle beam on the object plane is compensated. ## Claims ### Claim 1 A charged particle beam system, comprising: a charged particle beam generator configured to generate a charged particle beam having a beam path; a first lens configured to focus the charged particle beam generated in an object plane; a second lens located downstream of the object plane along the beam path, the second lens having a diffraction plane; a first lens doublet located downstream of the second lens along the beam path, the first lens doublet comprising a third lens and a fourth lens, the first lens doublet being configured to image the diffraction plane into a first intermediate diffraction plane; a first multipole located at the first intermediate diffraction plane; a second lens doublet located downstream of the first multipole along the beam path, the second lens doublet comprising a fifth lens and a sixth lens, the second lens doublet being configured to image the first intermediate diffraction plane into a second intermediate diffraction plane; a second multipole located at the second intermediate diffraction plane; a first deflection system upstream of the object plane along the beam path, the first deflection system being configured to tilt the charged particle beam about the object plane so that the charged particle beam is obliquely incident on the object plane; and a second deflection system located downstream of the third lens along the beam path and upstream of the fourth lens along the beam path, the second deflection system being configured to tilt the charged particle beam to compensate for tilting of the charged particle beam due to the first deflection system. ### Claim 2 (depends on 1) The charged particle beam system according to claim 1, wherein the second and third lenses are configured to image the object plane into an intermediate image plane located downstream of the third lens along the beam path and upstream of the fourth lens along the beam path. ### Claim 3 (depends on 2) The charged particle beam system according to claim 2, wherein the second deflection system is configured to tilt the beam about the intermediate image plane. ### Claim 4 (depends on 2) The charged particle beam system according to claim 2, wherein the fourth and fifth lenses are configured to image the first intermediate image plane into a second intermediate image plane located downstream of the fifth lens along the beam path and upstream of the sixth lens along the beam path. ### Claim 5 (depends on 1) The charged particle beam system according to claim 1, further comprising a tilt controller configured to synchronously control an amount by which the charged particle beam tilts due to the first deflection system and an amount by which the charged particle beam tilts due to the second deflection system. ### Claim 6 (depends on 5) The charged particle beam system according to claim 5, wherein the tilt controller is configured to control the first and second deflection systems so that the amounts of beam tilt generated by the first and second deflection systems change at a frequency greater than 50 Hz. ### Claim 7 (depends on 5) The charged particle beam system according to claim 5, wherein the tilt controller is configured to control the first and second deflection systems so that the amounts of beam tilt generated by the first and second deflection systems change at a frequency greater than 100 Hz. ### Claim 8 (depends on 5) The charged particle beam system according to claim 5, further comprising a corrector controller configured to control at least one element selected from the group consisting of the third lens, the fourth lens, the fifth lens, the sixth lens, the first multipole and the second multipole, wherein the corrector controller comprises a low pass filter configured to control the second deflection system. ### Claim 9 (depends on 8) The charged particle beam system according to claim 8, wherein the low pass filter is configured so that control signals supplied to deflectors of the second deflection system are substantially free of signal components having frequencies greater than 30 Hz. ### Claim 10 (depends on 8) The charged particle beam system according to claim 8, further comprising a switch configured to selectively connect the second deflection system to a member selected from the group consisting of the tilt controller and the corrector controller. ### Claim 11 (depends on 1) The charged particle beam system according to claim 1, further comprising an energy filter located downstream of the seventh lens along the beam path, wherein the energy filter has an entrance pupil plane and an entrance image plane. ### Claim 12 (depends on 11) The charged particle beam system according to claim 11, further comprising an eighth lens located upstream of the energy filter along the beam path, wherein the eighth lens is configured to image the object plane or an intermediate image of the object plane into the entrance pupil plane of the energy filter, and/or wherein the eighth lens is configured to image the diffraction plane or an intermediate image of the diffraction plane into the entrance image plane of the energy filter. ### Claim 13 (depends on 11) The charged particle beam system according to claim 11, wherein: the first deflection system is configured to displace the charged particle beam in the object plane such that a location of incidence of the charged particle beam on the object plane is changed; the charged particle beam system further comprises a third deflection system located upstream of the energy filter along the beam path; and the third deflection system is configured to deflect the charged particle beam to compensate a change of the location of incidence of the charged particle beam on the object plane generated by the first deflection system. ### Claim 14 (depends on 13) The charged particle beam system according to claim 13, wherein the third deflection system is located upstream of the eighth lens along the beam path, and the third deflection system is configured to tilt the beam about the entrance image plane of the eighth lens. ### Claim 15 (depends on 13) The charged particle beam system according to claim 13, wherein the third deflection system is located downstream of the eighth lens along the beam path and upstream of the energy filter along the beam path, and the third deflection system is configured to tilt the beam about the entrance image plane of the energy filter. ### Claim 16 (depends on 13) The charged particle beam system according to claim 13, further comprising a displacement controller configured to synchronously control an amount by which the charged particle beam tilts due to the first deflection system and an amount by which the charged particle beam tilts due to the second deflection system. ### Claim 17 (depends on 1) The charged particle beam system of claim 1, wherein the charged particle beam generator is configured to generate an electron beam. ### Claim 18 (depends on 1) The charged particle beam system of claim 1, wherein the charged particle beam generator is configured to generate an ion beam. ### Claim 19 A charged particle system, comprising: a charged particle beam generator configured to generate a charged particle beam having a beam path; a first lens configured to focus the charged particle beam generated in an object plane; a second lens located downstream of the object plane along the beam path, the second lens having a diffraction plane; a first lens doublet located downstream of the second lens along the beam path, the first lens doublet comprising a third lens and a fourth lens, the first lens doublet being configured to image the diffraction plane into a first intermediate diffraction plane; a first multipole located at the first intermediate diffraction plane; a second lens doublet located downstream of the first multipole along the beam path, the second lens doublet comprising a fifth lens and a sixth lens, the second lens doublet being configured to image the first intermediate diffraction plane into a second intermediate diffraction plane; a second multipole located at the second intermediate diffraction plane; a first deflection system upstream of the object plane along the beam path, the first deflection system being configured to tilt the charged particle beam about the object plane so that the charged particle beam is obliquely incident on the object plane; a second deflection system located downstream of the third lens along the beam path and upstream of the fourth lens along the beam path, the second deflection system being configured to tilt the charged particle beam to compensate for tilting of the charged particle beam due to the first deflection system; a tilt controller configured to synchronously control an amount by which the charged particle beam tilts due to the first deflection system and an amount by which the charged particle beam tilts due to the second deflection system; and a corrector controller comprising a low pass filter configured to control the second deflection system, wherein: the second and third lenses are configured to image the object plane into an intermediate image plane located downstream of the third lens along the beam path and upstream of the fourth lens along the beam path; the second deflection system is configured to tilt the beam about the intermediate image plane; the fourth and fifth lenses are configured to image the first intermediate image plane into a second intermediate image plane located downstream of the fifth lens along the beam path and upstream of the sixth lens along the beam path; and the corrector controller is configured to control at least one element selected from the group consisting of the third lens, the fourth lens, the fifth lens, the sixth lens, the first multipole and the second multipole. ### Claim 20 (depends on 1) A method, comprising: using the charged particle beam according to claim 1 to obtain a diffraction pattern of a sample.