# US 8,541,529 B2 · Positive resist composition, method of forming resist pattern, and polymeric compound

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- Number: US 8,541,529 B2
- Document ID: US8541529B2
- Status: Granted
- Kind: B2
- Application number: 13/454,399
- Filed: 2012-04-24
- Published: 2012-08-09
- Granted: 2013-09-24
- Earliest claimed: 2008-08-22
- Assignees: Tokyo Ohka Kogyo Co., Ltd.
- Applicants: Takahiro Dazai; Tomoyuki Hirano; Daiju Shiono; Tasuku Matsumiya
- Inventors: Takahiro Dazai; Tomoyuki Hirano; Daiju Shiono; Tasuku Matsumiya
- Web page: https://patentgrep.com/patent/US8541529B2

## CPC

- G03F 7/2041: {in the presence of a fluid, e.g. immersion; using fluid cooling means}
- C08F 28/06: by a heterocyclic ring containing sulfur
- C08F 220/281: {and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate}
- C08F 220/283: {and containing one or more carboxylic moiety in the chain, e.g. acetoacetoxyethyl(meth)acrylate}
- C08F 228/06: by a heterocyclic ring containing sulfur
- G03F 7/0045: {with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors}
- G03F 7/0397: {the macromolecular compound having an alicyclic moiety in a side chain}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- C08F: MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS

## Abstract

A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.

## Claims

### Claim 1

A polymeric compound comprising a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group,
wherein the amount of the structural unit (a0) within the polymeric compound based on the combined total of all structural units constituting the polymeric compound is 1 to 60 mol %:
wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; R2 represents a divalent linking group; and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof.

### Claim 2 (depends on 1)

The polymeric compound according to claim 1, wherein the structural unit (a1) comprises a structural unit derived from an acrylate ester containing a monocyclic, acid dissociable, dissolution inhibiting group and a structural unit derived from an acrylate ester containing a polycyclic, acid dissociable, dissolution inhibiting group.

### Claim 3 (depends on 1)

The polymeric compound according to claim 1, wherein the amount of the structural unit (a1) based on the combined total of all structural units constituting the polymeric compound is 10 to 80 mol %.

### Claim 4 (depends on 1)

The polymeric compound according to claim 1, which has a weight average molecular weight of 2,000 to 50,000.

### Claim 5 (depends on 1)

A positive resist composition comprising a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure,
wherein the base component (A) comprises the polymeric compound of claim 1.

### Claim 6

A method of producing a polymeric compound, comprising:
polymerizing a compound (I) represented by general formula (I) shown below and an acrylate ester containing an acid dissociable, dissolution inhibiting group:
wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; R2 represents a divalent linking group; and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof.