# US 8,541,482 B2 · Removable multilayer nail coating system and methods therefore

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- Number: US 8,541,482 B2
- Document ID: US8541482B2
- Status: Granted
- Kind: B2
- Application number: 12/573,640
- Filed: 2009-10-05
- Published: 2011-04-07
- Granted: 2013-09-24
- Earliest claimed: 2009-10-05
- Assignees: Creative Nail Design, Inc.
- Applicants: Thong Vu; Douglas D. Schoon
- Inventors: Thong Vu; Douglas D. Schoon
- Web page: https://patentgrep.com/patent/US8541482B2

## CPC

- A45D 31/00: Artificial nails
- A61K 8/39: Derivatives containing from 2 to 10 oxyalkylene groups
- A61K 8/731: {Cellulose; Quaternized cellulose derivatives}
- A61K 8/87: Polyurethanes
- A61K 8/91: Graft copolymers (A61K8/89 takes precedence)
- A61Q 3/02: Nail coatings
- C08F 251/02: on to cellulose or derivatives thereof
- A61K 2800/81: Preparation or application process involves irradiation
- A61K 2800/95: Involves in-situ formation or cross-linking of polymers
- A45D: HAIRDRESSING OR SHAVING EQUIPMENT (wigs, toupees or the like A41G3/00, A41G5/00; hairdressers' chairs A47C1/04; hair cutting appliances, razors B26B); EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
- A61K: PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES (devices or methods specially adapted for bringing pharmaceutical products into particular physical or administering forms A61J3/00; chemical aspects of, or use of materials for deodorisation of air, for disinfection or sterilisation, or for bandages, dressings, absorbent pads or surgical articles A61L; soap compositions C11D)
- A61Q: SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- C08F: MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS

## Abstract

The present disclosure relates generally to compositions for nail coatings, and particularly, but not by way of limitation, to polymerizable compositions. The disclosure further relates to methods of making a polymerizable, protective and scratch resistant topcoat layer that can be easily removed.

## Claims

### Claim 1

A multilayer nail covering system comprising at least a first layer and a second layer,
wherein at least one of the first and second layer is curable to an acrylic thermoset lattice layer covering a nail surface upon exposure to actinic radiation;
wherein at least one of the first or second layer comprises:
hydroxypropyl methacrylate (HPMA),
at least one reactive urethane (meth)acrylate, and
a sufficient amount of a non-reactive, solvent-dissolvable polymer and a non-reactive solvent such that, when cured to the nail surface, the system is removable from the nail surface within 20 minutes of exposure to organic solvent.

### Claim 2 (depends on 1)

The nail covering system of claim 1, wherein the at least one layer further comprises hydroxyethylmethacrylate (HEMA).

### Claim 3 (depends on 1)

The nail covering system of claim 1, wherein said non-reactive, solvent-dissolvable polymer is a cellulose ester.

### Claim 4 (depends on 3)

The nail covering system of claim 3, wherein said cellulose ester is a cellulose acetate alkylate.

### Claim 5 (depends on 4)

The nail covering system of claim 4, wherein said cellulose acetate alkylate is selected from the group consisting of cellulose acetate butyrate, cellulose acetate propionate, and mixtures thereof.

### Claim 6 (depends on 1)

The nail covering system of claim 1, wherein said non-reactive solvent is selected from the group consisting of ketones, alkyl acetates, alcohols, alkanes, alkenes, and mixtures thereof.

### Claim 7 (depends on 1)

The nail covering system of claim 1, wherein said non-reactive solvent is selected from the group consisting of acetone, ethyl acetate, butyl acetate, isopropyl alcohol, ethanol, methyl ethyl ketone, toluene, hexane, and mixtures thereof.

### Claim 8 (depends on 1)

The nail covering system of claim 1, wherein the at least one layer further comprises at least one photoinitiator.

### Claim 9 (depends on 8)

The nail covering system of claim 8, wherein said at least one photoinitiator is selected from the group consisting of benzoylphenylphosphinates, cyclohexylphenyl ketones, benzyl ketals, and mixtures thereof.

### Claim 10 (depends on 9)

The nail covering system of claim 9, wherein said at least one photoinitiator is selected from the group consisting of 2,4,6-trimethylbenzoyldiphenylphosphinate, hydroxycyclohexyl phenyl ketone, benzyl dimethyl ketal, and mixtures thereof.

### Claim 11 (depends on 1)

The nail covering system of claim 1, wherein the at least one layer further comprises at least one addition-polymerizable, ethylenically-unsaturated monomer.

### Claim 12 (depends on 1)

The nail covering system of claim 1, wherein upon exposure to actinic radiation, the at least one layer cures to an acrylic thermoset lattice layer having voids defined therein, wherein at least a portion of said voids contain said at least one non-reactive, solvent-dissolvable polymer.

### Claim 13 (depends on 1)

The nail covering system of claim 1, wherein said non-reactive, solvent-dissolvable polymer is present at from about 5 to about 90 wt %.

### Claim 14 (depends on 1)

The nail covering system of claim 1, wherein said non-reactive, solvent-dissolvable polymer is present at from about 20 to about 80 wt %.

### Claim 15 (depends on 1)

The nail covering system of claim 1, wherein said non-reactive, solvent-dissolvable polymer is present at from about 30 to about 70 wt %.

### Claim 16 (depends on 1)

The nail covering system of claim 1, wherein the organic solvent is acetone.

### Claim 17 (depends on 1)

The nail covering system according to claim 1, wherein the at least one layer further comprises an adhesion-promoting (meth)acrylate.

### Claim 18 (depends on 17)

The nail covering system according to claim 17, wherein said adhesion-promoting (meth)acrylate is selected from the group consisting of tetrahydrofurfural methacrylate, ethyl methacrylate, pyromellitic dianhydride glyceryl dimethacrylate, and mixtures thereof.

### Claim 19 (depends on 1)

The nail covering system according to claim 1, wherein the at least one layer further comprises pyromellitic glyceryl dimethacrylate.

### Claim 20 (depends on 1)

The nail covering system according to claim 1, wherein the at least one layer further comprises at least one polyalkylene glycol mono(meth)acrylate.

### Claim 21 (depends on 20)

The nail covering system according to claim 20, wherein said at least one polyalkylene glycol mono(meth)acrylate is a compound selected from the group consisting of polypropylene glycol monomethacrylates, polyethylene glycol monomethacrylates, and mixtures thereof.

### Claim 22 (depends on 1)

The nail covering system of claim 1, wherein said at least one urethane (meth)acrylate has a molecular weight of from about 300 to about 1,000.

### Claim 23 (depends on 1)

The nail covering system of claim 1, wherein the at least one layer further comprises at least one plasticizer having the general structure RCO—OR′ where RCO— represents a carboxylic acid radical, where —OR′ is an alcohol residue, and where R and R′ are fatty radicals having 6 to 30 saturated or unsaturated carbon atoms.

### Claim 24 (depends on 1)

The nail covering system according to claim 1, wherein the at least one layer further comprises a reactive (meth)acrylate monomer or polymer selected from the group consisting of: hydroxyethylmethacrylate (HEMA), ethyl methacrylate (EMA), tetrahydrofurfuryl methacrylate (THFMA), pyromellitic dianhydride di(meth)acrylate, pyromellitic dianhydride glyceryl dimethacrylate, pyromellitic dimethacrylate, methacroyloxyethyl maleate, 2-hydroxyethyl methacrylate/succinate, 1,3-glycerol dimethacrylate/succinate adduct, phthalic acid monoethyl methacrylate, acetoacetoxy ethyl methacylate (AAEMA), and mixtures thereof.

### Claim 25 (depends on 1)

The nail covering system according to claim 1, having a hardness of at least 3H on the pencil hardness test.

### Claim 26

A nail covering system comprising: a basecoat layer; an intermediate layer; and a topcoat layer; wherein at least one layer comprises:
(a) hydroxypropyl methacrylate (HPMA);
(b) at least one reactive urethane (meth)acrylate;
(c) at least one non-reactive, solvent-dissolvable polymer; and
(d) at least one non-reactive solvent; and
wherein, upon exposure to actinic radiation, the at least one layer cures to an acrylic thermoset lattice layer covering a nail surface.