Transporting method, transporting apparatus, exposure method, and exposure apparatus
AssigneeNikon Corporation
InventorMaiko Yamaguchi
Life of this patent
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Abstract
A ladder type stage apparatus that transports a film-shaped substrate includes a plurality of rods whose longitudinal directions are aligned in a direction that is orthogonal to the moving direction of the film-shaped substrate in order to support the film-shaped substrate; chains that join the rods along a closed-loop trajectory; and a drive motor that moves the rods along this loop-shaped trajectory via the chains.
Claims5
An exposure method for exposing a predetermined pattern onto a film-shaped member, the method comprising:
- supporting a plurality of surface locations of the film-shaped member by a plurality of rod-shaped members while holding the film-shaped member by the rod-shaped members using suction, wherein a longitudinal direction of the rod-shaped members intersects a predetermined moving direction of the film-shaped member;
- moving the rod-shaped members along with the film-shaped member in the moving direction while the rod-shaped members support the film-shaped member and hold the film-shaped member using suction;
- detecting an alignment mark that is formed on the film-shaped member with an area to be exposed of the film-shaped member that is supported by the rod-shaped members;
- and
- performing alignment between the area to be exposed of the film-shaped member and the predetermined pattern based on a detection result of the alignment mark, and exposing the area to be exposed of the film-shaped member supported by the rod-shaped members which are moving in the moving direction.
A device manufacturing method comprising:
- supporting a plurality of surface locations of a film-shaped photosensitive substrate by a plurality of rod-shaped members while holding the film-shaped photosensitive substrate by the rod-shaped members using suction, wherein a longitudinal direction of the rod-shaped members intersects a predetermined moving direction of the film-shaped photosensitive substrate;
- moving the rod-shaped members along with the film-shaped photosensitive substrate in the moving direction while the rod-shaped members support the film-shaped photosensitive substrate and hold the film-shaped photosensitive substrate using suction;
- detecting an alignment mark that is formed on the film-shaped photosensitive substrate with an area to be exposed of the film-shaped photosensitive substrate that is supported by the rod-shaped members;
- and
- performing alignment between the area to be exposed of the film-shaped photosensitive substrate and a predetermined pattern based on a detection result of the alignment mark;
- exposing, with the predetermined pattern, the area to be exposed of the film-shaped photosensitive substrate supported by the rod-shaped members which are moving in the moving direction;
- and
- processing the film-shaped photosensitive substrate after the exposure.
A device manufacturing method using an exposure apparatus which exposes a predetermined pattern onto a film-shaped substrate, the method comprising:
- operating a transporting apparatus attached to the exposure apparatus, the transporting apparatus comprising:
- a plurality of rod-shaped members whose longitudinal direction intersects a predetermined moving direction along a surface of the film-shaped substrate, wherein the rod-shaped members support the film-shaped substrate while holding the film-shaped substrate using suction;
- and
- a drive unit that moves the rod-shaped members along with the film-shaped substrate in the moving direction while the rod-shaped members support the film-shaped substrate and hold the film-shaped substrate using suction,
- operating a mark detection system of the exposure apparatus to detect an alignment mark formed on the film-shaped substrate, wherein the alignment mark is arranged with an area to be exposed of the film-shaped substrate that is supported by the at least one of the rod-shaped members;
- operating an exposure section of the exposure apparatus to perform alignment between the area to be exposed of the film-shaped substrate and the predetermined pattern based on a detection result by the mark detection system, and to expose the area to be exposed of the film-shaped substrate supported by the at least one of rod-shaped members while moving in the moving direction;
- and
- processing the film-shaped substrate after the exposure.
A device manufacturing method for exposing a device pattern image onto a film-shaped flexible substrate, the method comprising:
- transporting the film-shaped flexible substrate in a moving direction while the film-shaped flexible substrate is supported by a plurality of rod-shaped members and held by the rod-shaped members using suction,
- wherein a longitudinal direction of the rod-shaped members intersects the moving direction,
- moving the rod-shaped members along with the film-shaped flexible substrate in the moving direction while the rod-shaped members support the film-shaped flexible substrate and hold the film-shaped flexible substrate using suction;
- and
- exposing an area to be exposed of the flexible substrate with the device pattern image while transporting the film-shaped flexible substrate by the synchronization movement of the rod-shaped members in the moving direction.
Dependencies are inferred from the claim text.