# US 8,541,148 B2 · Method for making a laminated chip and method for aligning a lithographic mask

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- Number: US 8,541,148 B2
- Document ID: US8541148B2
- Status: Granted
- Kind: B2
- Application number: 13/092,766
- Filed: 2011-04-22
- Published: 2011-10-27
- Granted: 2013-09-24
- Earliest claimed: 2010-04-26
- Assignees: Max Echo Technology Corporation
- Applicants: Chi-Chi Huang
- Inventors: Chi-Chi Huang
- Web page: https://patentgrep.com/patent/US8541148B2

## CPC

- G03F 9/7096: {Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus}
- G03F 9/7088: {Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A method for making a laminated chip includes: (a) forming a first conductive layer on a substrate; (b) forming an insulating layer on the first conductive layer opposite to the substrate; (c) bombarding the insulating layer using an electron beam to form a plurality of holes that expose the first conductive layer; and (d) forming a second conductive layer on the insulating layer such that a part of the second conductive layer extends into the holes to electrically connect to the first conductive layer.

## Claims

### Claim 1

A method for aligning a lithographic mask using an aligning device, the lithographic mask having mask alignment marks, the aligning device having a base that is formed with at least two separated light-transmissible sections, the method comprising:
(a) disposing a light-transmissible film on the base;
(b) bombarding the light-transmissible film at regions corresponding to the light-transmissible sections of the base using an electron beam so as to form film alignment marks on the light-transmissible film; and
(c) disposing the lithographic mask on the light-transmissible film in a way that the mask alignment marks on the lithographic mask are aligned with the film alignment marks on the light-transmissible film.

### Claim 2 (depends on 1)

The method of claim 1, wherein the electron beam is derived from laser.

### Claim 3 (depends on 1)

The method of claim 1, wherein the light-transmissible sections are through holes.