# US 8,541,101 B2 · Coating, article coated with coating, and method for manufacturing article

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- Number: US 8,541,101 B2
- Document ID: US8541101B2
- Status: Granted
- Kind: B2
- Application number: 13/008,984
- Filed: 2011-01-19
- Published: 2012-03-01
- Granted: 2013-09-24
- Earliest claimed: 2010-08-30
- Assignees: HONG FU JIN PRECISION INDUSTRY (ShenZhen) CO., LTD.; Hon Hai Precision Industry Co., Ltd.
- Applicants: Hsin-Pei Chang; Wen-Rong Chen; Huann-Wu Chiang; Cheng-Shi Chen; Zhi-Jie Hu
- Inventors: Hsin-Pei Chang; Wen-Rong Chen; Huann-Wu Chiang; Cheng-Shi Chen; Zhi-Jie Hu
- Web page: https://patentgrep.com/patent/US8541101B2

## CPC

- C23C 14/0641: {Nitrides (C23C14/0617 takes precedence)}
- C23C 14/0084: {Producing gradient compositions}
- C23C 14/0664: {Carbonitrides}
- C23C 28/00: Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- Y10T 428/24975: No layer or component greater than 5 mils thick
- Y10T 428/265: 1 mil or less
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

A coating includes a titanium aluminum layer; a titanium aluminum nitride layer deposited on the titanium aluminum layer; a titanium aluminum carbon-nitride layer deposited on the titanium aluminum nitride layer; and a silicon carbon-nitride layer deposited on the titanium aluminum carbon-nitride layer.

## Claims

### Claim 1

An article, comprising:
a substrate; and
a coating comprising:
a titanium aluminum layer;
a titanium aluminum nitride layer deposited on the titanium aluminum layer;
a titanium aluminum carbon-nitride layer deposited on the titanium aluminum nitride layer; and
a silicon carbon-nitride layer deposited on the titanium aluminum carbon-nitride layer.

### Claim 2 (depends on 1)

The article as claimed in claim 1, wherein the atomic carbon content and the atomic nitrogen content in the titanium aluminum carbon-nitride layer both gradually increase from the titanium aluminum nitride layer to the silicon carbon-nitride layer.

### Claim 3 (depends on 2)

The article as claimed in claim 2, wherein the titanium aluminum carbon-nitride layer has a thickness ranging from about 0.6 micrometers to about 2.0 micrometers.

### Claim 4 (depends on 3)

The article as claimed in claim 3, wherein the titanium aluminum layer has a thickness ranging from about 100 nanometers to about 300 nanometers; the titanium aluminum nitride layer has a thickness ranging from about 100 nanometers to about 300 nanometers; the silicon carbon-nitride layer has a thickness ranging from about 100 nanometers to about 400 nanometers; the coating has a thickness ranging from about 0.7 micrometers to 2.5 micrometers.

### Claim 5 (depends on 1)

The article as claimed in claim 1, wherein each of the titanium aluminum layer, the titanium aluminum nitride layer, and the titanium aluminum carbon-nitride layer is formed by magnetron sputtering, using a titanium aluminum alloy target containing atomic titanium in a range from about 50 to about 72 wt %.