# US 8,540,850 B2 · Target arrangement for mounting / dismounting and method of manufacturing

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- Number: US 8,540,850 B2
- Document ID: US8540850B2
- Status: Granted
- Kind: B2
- Application number: 11/639,034
- Filed: 2006-12-14
- Published: 2007-06-28
- Granted: 2013-09-24
- Earliest claimed: 2005-12-23
- Assignees: Oc Oerlikon Balzers AG
- Applicants: Marcel Neusch; Peter Schlegel; Hartmut Rohrmann; Oliver Rattunde
- Inventors: Marcel Neusch; Peter Schlegel; Hartmut Rohrmann; Oliver Rattunde
- Web page: https://patentgrep.com/patent/US8540850B2

## CPC

- C23C 14/3407: {Cathode assembly for sputtering apparatus, e.g. Target}
- H01J 37/34: operating with cathodic sputtering (H01J37/36 takes precedence {; methods of cathodic sputtering C23C14/34})
- H01J 37/3423: {Shape}
- H01J 37/3435: {Target holders (includes backing plates and endblocks)}
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)

## Abstract

So as to provide a target arrangement with improved mounting and dismounting ability, the target arrangement comprises a plate along a plane (E) which has a border (7) defined by a first wedge surface (5u) angled to the addressed general plane (E) and a second wedge surface (5l) which is substantially planar as well and angled with respect to the generic plane (E). The two wedge surfaces mutually convert in a direction along the addressed plane (E) and from a more central area of the plate outwardly.

## Claims

### Claim 1

A material source comprising a removable target arrangement,
the target arrangement comprising a plate, separable first and second clamping means, and at least one clamp biasing member for biasing the first and second clamping means towards each other to clamp part of the plate therebetween,
wherein said target arrangement can be mounted and dismounted as a unitary part onto and off of said material source, the target arrangement of the material source being provided to free material to a vacuum coating process,
wherein the plate of said target arrangement is provided along a plane, at least a predominant part of an outer border of said plate being wedge-shaped by a first substantially planar wedge surface angled to said plane and a second substantially planar wedge surface angled to said plane, said first and second wedge surfaces mutually converging in a direction along said plane and from a central area of said plate perpendicularly towards said outer border of said plate, the first and second clamping means are respectively provided with a first and a second substantially planar wedge counter surface, and said first and second clamping means being biased towards each other with said first and second wedge counter surfaces biased towards and on said first and second wedge surfaces, the clamp biasing member exerting a force which is generally perpendicular to the plane and which creates a pressure between said wedge surfaces and counter surfaces to thereby clamp the plate, and
wherein the target arrangement, including the first and second clamping means, the plate clamped by the clamping means, and the at least one clamp biasing member, is releasably mounted to a frame of said material source by at least one frame mounting element,
wherein the frame mounting element and the clamp biasing member are distinct and independently releasable elements, and
wherein the frame mounting element is releasably connected to the frame of the material source and the clamp biasing member is not directly connected to the frame of the material source.

### Claim 2 (depends on 1)

The arrangement of claim 1 wherein said plate has a surface parallel to said plane which is of said material.

### Claim 3 (depends on 1)

The arrangement of claim 1, wherein said plate is a target.

### Claim 4 (depends on 1)

The arrangement of claim 1, wherein said part of said outer border of said plate is of ferromagnetic material.

### Claim 5 (depends on 4)

The arrangement of claim 4, wherein said material to be freed is ferromagnetic material.

### Claim 6 (depends on 1)

The arrangement of claim 1, being a sputter target arrangement.

### Claim 7 (depends on 1)

The arrangement of claim 1, wherein said first and second wedge surfaces are substantially equally angled to said plane.

### Claim 8

A method of manufacturing a device including the step of applying at least one layer comprising a ferromagnetic material on a substrate, comprising the steps of:
mounting a target arrangement to a magnetron source, within a vacuum chamber, said target arrangement comprises a plate along a plane, with separable first and second clamping means, and at least one clamp biasing member for biasing said clamping means towards each other, wherein at least a predominant part of an outer border of said plate is wedge-shaped having a first substantially planar wedge surface angled to said plane and a second substantially planar wedge surface angled to said plane, said first and second wedge surfaces mutually converging in a direction along said plane and from a central area of said plate perpendicularly towards said outer border of said plate,
clamping said first and second wedge surfaces of the plate border by biasing said first and second clamping means provided with a first and a second substantially planar wedge counter surface, and said first and second clamping means being biased towards each other by the at least one clamp biasing member with the first and second wedge counter surfaces biased towards and on said first and second wedge surfaces, positioning at least one substrate with a surface to be coated facing towards said mounted target arrangement, said target arrangement, including said plate, said clamp biasing member, and said clamping means, being releasably mounted to a frame of the magnetron source by at least one frame mounting element which is distinct and separately operable from the at least one clamp biasing member, and
sputter coating said substrate.

### Claim 9 (depends on 8)

The method of claim 8, said device being one of a read head, a write head, a read/write head, all for storage disks, a magnetic data storage disc, or a semiconductor device.

### Claim 10 (depends on 4)

A magnetron sputter source comprising a target arrangement according to claim 4, and a magnet arrangement generating a magnetic field upon said target arrangement.

### Claim 11 (depends on 1)

The arrangement of claim 1 wherein the first and second clamping means are adjustably biased towards said first and second wedge surfaces of said outer border of said plate.

### Claim 12 (depends on 8)

The method of claim 8 wherein the first and second clamping means are adjustably biased towards said first and second wedge surfaces of said outer border of said plate.