# US 8,539,907 B2 · Apparatus for chemical bath deposition between two covers, wherein a cover is a substrate

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- Number: US 8,539,907 B2
- Document ID: US8539907B2
- Status: Granted
- Kind: B2
- Application number: 13/090,219
- Filed: 2011-04-19
- Published: 2012-05-31
- Granted: 2013-09-24
- Earliest claimed: 2010-11-30
- Assignees: Industrial Technology Research Institute
- Applicants: Wei-Tse Hsu; Chung-Wen Lan; Yi-Song Luo
- Inventors: Wei-Tse Hsu; Chung-Wen Lan; Yi-Song Luo
- Web page: https://patentgrep.com/patent/US8539907B2

## CPC

- B05C 3/18: only one side of the work coming into contact with the liquid or other fluent material (B05C3/02 takes precedence)
- B05C: APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (spraying apparatus, atomising apparatus, nozzles B05B; plant for applying liquids or other fluent materials to objects by electrostatic spraying B05B5/08)

## Abstract

The invention provides a film deposition apparatus, which includes a first cover and a second cover, wherein the first cover and the second cover are disposed opposite to each other, and the first cover has at least two holes, and a spacer disposed between the first cover and the second cover, wherein the first cover, the spacer and the second cover form a film deposition space.

## Claims

### Claim 1

An apparatus for chemical bath deposition, comprising:
a first cover and a second cover, wherein the first cover and the second cover are disposed opposite to each other, the second cover is a substrate for film deposition using a solution, and the first cover has at least two holes;
a spacer disposed between the first cover and the second cover, wherein the first cover, the spacer and the second cover together form a film deposition space for containing the solution, arranged such that the second cover is horizontally disposed during the film deposition and removable from the first cover subsequent to the film deposition; and
a heater, wherein the second cover is disposed on the heater.

### Claim 2 (depends on 1)

The apparatus for chemical bath deposition as claimed in claim 1, further comprising a shaking device disposed below the heater.

### Claim 3 (depends on 1)

The apparatus for chemical bath deposition as claimed in claim 1, further comprising a shaking device disposed below the second cover.

### Claim 4 (depends on 1)

The apparatus for chemical bath deposition as claimed in claim 1, wherein the edge of first cover or the second cover has a groove, and the spacer is disposed in the groove.

### Claim 5 (depends on 1)

The apparatus for chemical bath deposition as claimed in claim 1, wherein the material of the first cover comprises aluminum alloy, glass, quartz, aluminum oxide or polymer.

### Claim 6 (depends on 5)

The apparatus for chemical bath deposition as claimed in claim 5, wherein the polymer comprises polyvinyl chloride (PVC), polytetrafluoroethylene (PTFE) or polypropylene (PP).

### Claim 7 (depends on 4)

The apparatus for chemical bath deposition as claimed in claim 4, wherein the groove comprises a circular or rectangular shape.

### Claim 8 (depends on 1)

The apparatus for chemical bath deposition as claimed in claim 1, further comprising a magnetic material in the first cover.

### Claim 9 (depends on 1)

The apparatus for chemical bath deposition as claimed in claim 1, wherein the material of the spacer comprises rubber, silicone or polytetrafluoroethylene (PTFE).

### Claim 10 (depends on 1)

The apparatus for chemical bath deposition as claimed in claim 1, wherein the material of the second cover comprises glass, stainless steel or polyimide (PI).

### Claim 11 (depends on 1)

The apparatus for chemical bath deposition as claimed in claim 1, wherein the first cover has an outer edge, and the outer edge has an extension portion, and the extension portion contacts the spacer.

### Claim 12 (depends on 1)

The apparatus for chemical bath deposition as claimed in claim 1, wherein the at least two holes comprise a first hole arranged to receive a solution for film deposition and a second hole arranged to output the solution.

### Claim 13 (depends on 1)

The apparatus for chemical bath deposition as claimed in claim 1, arranged such that the spacer is a sidewall of the film deposition space.

### Claim 14 (depends on 1)

The apparatus for chemical bath deposition as claimed in claim 1, wherein the second cover forms the bottom wall of the film deposition space.

### Claim 15 (depends on 1)

The apparatus for chemical bath deposition as claimed in claim 1, wherein another substrate for film deposition is disposed on an inner surface of the first cover.