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US 8,526,707 B2Granted
Method of inspecting a mask
AssigneeSamsung Electronics Co., Ltd.
InventorsYoonna Oh, Jae-Pil Shin, Jin Choi, Moon-Hyun Yoo, Jong-Bae Lee
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Abstract
In a method of inspecting a mask, an image of a pattern on the mask may be obtained. A histogram of the image by grey levels may be obtained. The histogram may be compared with information of the pattern to detect a defect of the mask. Thus, reliability of defect detection in the mask may be remarkably improved.
Claims4
A method of inspecting a mask, the method comprising:
- obtaining an image of a linear pattern on the mask;
- obtaining a histogram on which grey levels of the image are displayed;
- and
- comparing the histogram with information of the linear pattern to detect a defect of the mask, wherein obtaining the histogram comprises:
- measuring grey levels of the linear pattern along a lengthwise direction of the linear pattern;
- and
- measuring widths of the grey levels, wherein comparing the histogram with the information comprises determining a portion on the histogram discrepant with the information as a shift in the linear pattern.
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Dependencies are inferred from the claim text.