Flexible semiconductor device and method for producing the same

A flexible semiconductor device comprising:

• an insulating film;
• and
• a semiconductor device on the insulating film,
• wherein the insulating film includes an upper wiring pattern layer on an upper surface thereof and a lower wiring pattern layer on a lower surface thereof,
• wherein the semiconductor device comprises
• a semiconductor layer on the upper surface of the insulating film,
• a source electrode and a drain electrode on the upper surface of the insulating film so as to be in contact with the semiconductor layer, and
• a gate electrode on the lower surface of the insulating film so as to be opposed to the semiconductor layer,
• wherein an upper surface of the gate electrode protrudes toward the semiconductor layer beyond an upper surface of the lower wiring pattern layer so that a thickness of the gate electrode is larger than a thickness of the lower wiring pattern layer, and
• wherein, in the insulating film, a first film thickness of the insulating film opposes the source electrode, the drain electrode, the upper wiring pattern layer, and the lower wiring pattern layer is thicker than a second film thickness of the insulating film disposed between the gate electrode and the semiconductor layer.