System and method of electron beam writing
AssigneeCadence Design Systems, Inc.
InventorsDmitri Lanpanik, Shohei Matsushita, Takashi Mitsuhashi, Zhigang Wu
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Abstract
A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received information.
Claims30
A machine implemented method of electron beam writing comprising:
- receiving stencil design data of an electronic design and other information or data related to the electronic design;
- combining the stencil data and the other information or data to form combined data;
- determining an electron beam writing pattern based at least in part on the combined data by using at least a partial exposure process that is to be applied to at least a portion of a periphery area immediately adjacent to a character projection cell to place one or more circuit components in the electronic design;
- and
- causing an electron beam of an electron beam writing apparatus to write on a substrate or a mask in accordance with the electron beam writing pattern.
A method for electron beam writing, the method comprising:
- analyzing a cell layout pattern by calculating a number of repetitions of at least one cell of the cell layout pattern;
- building one or more cell projection candidates by using a result of the act of analyzing the cell layout pattern by using at least one processor;
- placing the one or more cell projection candidates on a stencil by at least applying a partial exposure process to at least a portion of a periphery area immediately adjacent to a candidate of the one or more cell projection candidates to place one or more circuit components in the electronic design in printing the cell layout pattern;
- estimating throughput of the cell projection candidates;
- and
- generating a stencil table to store a result of the act of placing the one or more cell projection candidates on the stencil.
A stencil design system for electron beam writing, the system comprising:
- at least one data structure to store stencil-related information;
- and
- a processor to:
- receive or identify the stencil-related information from the at least one data structure and to generate a cell table for an electron beam writer;
- and
- determine an electron beam writing pattern based at least in part upon combined data including the stencil-related information by using the processor that is to determine the electron beam writing pattern is further to at least apply a partial exposure to at least a portion of a periphery area immediately adjacent to a character projection cell to place one or more circuit components in the electronic design.
A computer program product comprising a non-transitory tangible computer usable medium having executable code which, when executed by at least one processor, causes the at least one processor to execute a process for electron beam writing, the product comprising:
- analyzing a cell layout pattern by calculating a number of repetitions of at least one cell of the cell layout pattern;
- building one or more cell projection candidates by using a result of the act of analyzing the cell layout pattern;
- placing the one or more cell projection candidates on a stencil by at least applying a partial exposure process to at least a portion of a periphery area immediately adjacent to a candidate of the one or more cell projection candidates in printing the cell layout pattern to place one or more circuit components in the electronic design;
- and
- generating a stencil table to store a result of the act of placing the one or more cell projection candidates on the stencil.
Dependencies are inferred from the claim text.