Lithography system
AssigneeMapper Lithography IP B.V.
InventorsJan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit
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AssigneeMapper Lithography IP B.V.
InventorsJan-Jaco Marco Wieland, Johannes Christiaan van 't Spijker, Remco Jager, Pieter Kruit
Estimating the term…
A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.
A modulation device for use in a maskless lithographic system, wherein said modulation device is a modulation plate comprising an array of modulators, wherein each modulator is adapted for either deflecting a beamlet away from the optical axis of said beamlet or letting a beamlet pass undeflected, said undeflected beamlets passing through the plate to the surface of a target, wherein said plate further comprises light sensitive elements, each light sensitive element in said modulation plate converting a modulated light beam into a signal for controlling one or more modulators of the array, wherein the light sensitive element is integrated in said modulation plate, and wherein the signals are transported from said light sensitive elements to said modulators by electric wires of a chip.
A method for transferring a pattern onto the surface of a target using a lithography system comprising at least one beam generator, a modulation array and a deflector array, said method comprising:
A method for transferring a pattern onto the surface of a target using a lithography system comprising at least one beam generator, a modulation array and a deflector array, said method comprising:
Dependencies are inferred from the claim text.