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AssigneeEbara Corporation
InventorsNobuharu Noji, Yoshihiko Naito, Hirosi Sobukawa, Kenji Terao, Masahiro Hatakeyama, Katsuya Okumura
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Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.
An inspection apparatus for inspecting a pattern formed in a sample by using an electron beam, characterized in comprising:
An inspection method for inspecting a pattern formed in a sample by using an electron beam, the method characterized in that a stage holding a sample thereon is moved at a frequency in synchronism with an operating frequency of a sensor during inspection of a pattern to be inspected, a moving speed of the stage is controlled so that a time required for movement is minimized during the stage being moved to another pattern to be inspected, and the charging period and the discharging period of a substrate is input previously into a control unit, and is combined with the position data of the pattern to be inspected for calculating the condition where the distance or time period of movement between the patterns is minimized and the period of movement between the patterns is equal among all patterns.
An inspection apparatus for inspecting a pattern formed in a sample by using an electron beam, characterized in comprising:
An inspection method for inspecting a pattern formed in a sample by using an electron beam, the method characterized in that a stage holding a sample thereon is moved at a frequency in synchronism with an operating frequency of a sensor during inspection of a pattern to be inspected, a moving speed of the stage is controlled so that a time required for movement is minimized during the stage being moved to another pattern to be inspected, and
Dependencies are inferred from the claim text.