Thin film article and method for forming a reduced conductive area in transparent conductive films for photovoltaic modules

A method for forming a chemically reduced conductive area in a transparent conductive layer of a thin film photovoltaic device, the method comprising:

• providing a superstrate having a first conductive layer thereon, wherein the first conductive layer comprises a transparent conductive oxide material;
• depositing a first semiconductor layer on the first conductive layer;
• depositing a second semiconductor layer on the first semiconductor layer;
• forming a first scribe by selectively removing the first conductive layer, the first semiconductor layer, and the second semiconductor layer;
• filling the first scribe with a dielectric material;
• thereafter, exposing the superstrate to a reducing atmosphere;
• in the reducing atmosphere, directing concentrated electromagnetic energy from an energy source toward the superstrate to form a second scribe having a chemically reduced conductive area defined in the first conductive layer, wherein the chemically reduced conductive area has greater electrical conductivity than the transparent conductive oxide material;
• and
• thereafter, forming a second conductive layer on the second semiconductor layer and the chemically reduced conductive area.