Susceptor with backside area of constant emissivity
AssigneeApplied Materials, Inc.
InventorsErrol Sanchez, David K. Carlson, Craig Metzner
Life of this patent
Estimating the term…
Abstract
Methods and apparatus for providing constant emissivity of the backside of susceptors are described. Provided is a method comprising: providing a susceptor in a deposition chamber, the susceptor comprising a susceptor plate and a layer comprising an oxide, a nitride, an oxynitride, or combinations thereof, the layer being stable in the presence of the reactive process gases; and locating the wafer on a support surface of the susceptor plate. The method can further comprise selectively depositing an epitaxial layer or a non-epitaxial layer on a surface of the wafer. The method can also further comprise selectively etching to maintain the oxide, nitride, oxynitride, or combinations thereof layer.
Claims8
A semiconductor method comprising:
- providing a susceptor in a deposition chamber, the susceptor comprising:
- a susceptor plate extending across the deposition chamber and having a support surface and a backside surface opposite the support surface;
- and
- a layer comprising an oxide, a nitride, an oxynitride, or combinations thereof covering an area consisting of only a portion of the backside surface of the susceptor plate, wherein the layer has a radius less than a radius of the susceptor plate such that a portion of the backside surface of the susceptor plate is free of the layer, the layer being stable in the presence of reactive process gases;
- locating a semiconductor wafer on the support surface of the susceptor plate;
- depositing material on a surface of the semiconductor wafer, the material formed from the reactive process gases;
- and
- inhibiting deposition of material on the layer,
- wherein the deposition chamber comprises an inlet for reactive process gases to form deposited material within the chamber and an infrared temperature sensor facing the backside of the susceptor to provide a viewing area for the temperature sensor.
Dependencies are inferred from the claim text.