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US 8,524,427 B2Granted
Electron beam lithography system and method for improving throughput
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJaw-Jung Shin, Shy-Jay Lin, Wen-Chuan Wang, Burn Jeng Lin
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Abstract
An electron beam lithography method and apparatus for improving throughput is disclosed. An exemplary lithography method includes receiving a pattern layout having a pattern layout dimension; shrinking the pattern layout dimension; and overexposing a material layer to the shrunk pattern layout dimension, thereby forming the pattern layout having the pattern layout dimension on the material layer.
Claims20
A method comprising:
- receiving a pattern layout having at least one feature;
- determining a size of the at least one feature is greater than a predetermined value;
- converting the at least one feature into a biased feature that has a plurality of sub-features having space interposing each of the plurality of sub-features;
- and
- writing an energy sensitive material layer according to the biased feature using an electron beam apparatus, thereby forming the at least one feature in the energy sensitive material layer, and wherein the writing is a direct writing without a photomask.
2 more elements
A method comprising:
- determining a predetermined size based on a pixel size registered in an electron beam tool,
- receiving a pattern layout having a first feature and a second feature;
- decomposing the first feature into a plurality of first sub-features, wherein each of the plurality of sub-features have a space therebetween;
- shrinking the second feature and the plurality of first sub-features, wherein the shrinking includes shrinking a dimension of the second feature and each of the plurality of first sub-features to the predetermined size;
- and
- writing a material layer using the electron beam tool according to the shrunk second feature and plurality of first sub-features, thereby forming the first feature and the second feature on the material layer.
3 more elements
Dependencies are inferred from the claim text.