Method of manufacturing a photomask
AssigneeSamsung Electronics Co., Ltd.
InventorsJin Choi, Dong-Seok Nam
Life of this patent
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Abstract
A method for correcting a position error of a lithography apparatus comprises inputting position data of exposure pattern, irradiating laser light onto a position reference mask from a position measurement laser system, calculating actual position data of the laser light irradiated onto the position reference mask, and comparing the position data of the exposure pattern with the actual position data of the laser light irradiated onto the position reference mask. With this method, circuit patterns can be accurately formed at predetermined positions on a photomask, and the circuit patterns on the photomask can be accurately formed at predetermined positions on a wafer.
Claims10
A method of correcting a position error of a photomask, the method comprising:
- disposing the photomask and a reference mask on a same stage, the reference mask having a reference grid;
- irradiating electron beams onto the photomask;
- irradiating laser light onto the reference mask to obtain the position error;
- and
- moving the stage to correct the position error.
Dependencies are inferred from the claim text.