Imprint lithography
AssigneeASML Netherlands B.V.
InventorsYvonne Wendela Kruijt-Stegeman, Ivar Schram, Sander Frederik Wuister, Jeroen Herman Lammers
Life of this patent
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Abstract
An imprint template cover for an imprint template having a pattern feature thereon. The cover is configured such that, in use, it extends around the pattern feature of the imprint template, and such that the cover does not contact the pattern feature.
Claims27
An imprint apparatus, comprising:
- a monolithic imprint template used in microlithography or nanolithography, the imprint template including a first surface having a sub-micron pattern feature and a second surface at a fixed non-zero depth from the first surface, the depth being perpendicular to the first surface;
- and
- an imprint template cover comprising a seal, wherein the cover is directly attached, in use, to the imprint template at the second surface such that the seal contacts the second surface and provides a gas-tight enclosure between the cover and the imprint template, and wherein the cover is configured such that, in use, the cover extends around the pattern feature, has a surface over and facing the pattern feature, and does not contact the pattern feature, and such that, when imprinting using the imprint template, the cover is no longer over the pattern feature,
- wherein the seal has a non-zero height that is less than the fixed non-zero depth.
An imprint lithography method comprising:
- covering a sub-micron pattern feature of a monolithic imprint template used in microlithography or nanolithography with a cover comprising a seal, wherein the imprint template includes a first surface having the pattern feature and a second surface at a fixed non-zero depth from the first surface, the depth being perpendicular to the first surface, and wherein the pattern feature is covered by directly attaching the cover to the imprint template at the second surface such that the seal contacts the second surface and provides a gas-tight enclosure between the cover and the imprint template, the cover extending around the pattern feature and having a surface over and facing the pattern feature, and configured such that it does not contact the pattern feature;
- and
- removing the cover from over the pattern feature, when imprinting using the imprint template,
- wherein the seal has a non-zero height that is less than the fixed non-zero depth.
An imprint lithography method comprising covering a pattern feature of an imprint template used in microlithography or nanolithography with a cover by directly attaching the cover to the imprint template, the cover extending over and around the pattern feature and configured such that it does not contact the pattern feature, and such that, when imprinting using the imprint template, the cover is no longer over the pattern feature, wherein the pattern feature is covered before the imprint template is cut away from a body of material.
Dependencies are inferred from the claim text.