Process for the production of microelectromechanical systems
AssigneeSolvay Fluor GmbH
InventorMarcello Riva
Life of this patent
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Abstract
Elemental fluorine and carbonyl fluoride are suitable etchants for producing microelectromechanical devices (“MEMS”). They are preferably applied as mixtures with nitrogen and argon. If applied in Bosch-type process, C4F6 is a highly suitable passivating gas.
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Claims18
A method of producing a microelectromechanical system (“MEMS”) from a structure comprising a step wherein the structure is etched applying an etching gas,
- wherein said etching gas is a mixture consisting of elemental fluorine, nitrogen, argon, and optionally oxygen, said mixture containing equal to or more than 10% by volume of elemental fluorine, equal to or less than 25% by volume of elemental fluorine, equal to or more than 5% by volume of argon, equal to or less than 15% by volume of argon, equal to or more than 65% by volume of nitrogen, equal to or less than 80% by volume of nitrogen, and optionally between 2 and 15% by volume of oxygen, the contents adding up to 100% by volume.
A mixture, comprising carbonyl fluoride, a passivating gas, and argon, and optionally further comprising a compound selected from the group consisting of nitrogen, hydrogen, and a hydrogen-releasing gas,
- wherein the content of carbonyl fluoride is equal to or greater than 15% by volume and equal to or lower than 60% by volume;
- wherein the content of the passivating agent is equal to or greater than 10% by volume and equal to or lower than 50% by volume;
- wherein the content of argon is equal to or greater than 20% by volume and equal to or lower than 50% by volume;
- wherein, when nitrogen is comprised in the mixture, its content is in a range of from 1 to 10% by volume;
- and wherein, when hydrogen or the hydrogen-releasing gas is comprised in the mixture, its content is equal to or greater than 2% by volume and equal to or lower than 15% by volume.
A mixture consisting of elemental fluorine, nitrogen, argon, and optionally oxygen, said mixture containing equal to or more than 10% by volume of elemental fluorine, equal to or less than 25% by volume of elemental fluorine, equal to or more than 5% by volume of argon, equal to or less than 15% by volume of argon, equal to or more than 65% by volume of nitrogen, equal to or less than 80% by volume of nitrogen, and optionally between 2 and 15% by volume of oxygen, the contents adding up to 100% by volume.
Dependencies are inferred from the claim text.