Process to make PMR writer with leading edge shield (LES) and leading edge taper (LET)
AssigneeHGST Netherlands B.V.
InventorsLiubo Hong, Fenglin Liu, Qiping Zhong, Honglin Zhu
Life of this patent
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Abstract
Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.
Claims20
A method of fabricating a magnetic head, comprising:
- depositing a chemical mechanical polishing stop layer over a substrate;
- forming a photoresist mask over the chemical mechanical polishing stop layer;
- reactive ion etching at least a portion of the chemical mechanical polishing stop layer and at least a portion of the substrate to form a feature definition, the reactive ion etching occurring at an angle of between 10 degrees to 60 degrees relative to normal to form tapered sidewalls of the feature definition;
- removing the photoresist mask to expose the chemical mechanical polishing stop layer;
- depositing leading edge shield material into the feature definition and over the exposed chemical mechanical polishing stop layer;
- chemical mechanical polishing the leading edge shield material to expose the chemical mechanical polishing stop layer;
- removing the chemical mechanical polishing stop layer;
- and
- depositing a magnetic pole over the leading edge shield material and the substrate.
A method of fabricating a magnetic head, comprising:
- forming a photoresist mask over a substrate;
- reactive ion etching at least a portion of the substrate to form a feature definition, the reactive ion etching occurring at an angle of between 10 degrees to 60 degrees relative to normal to form tapered sidewalls of the feature definition;
- removing the photoresist mask to expose the substrate;
- depositing a chemical mechanical polishing stop layer over the substrate and in the feature definition;
- depositing leading edge shield material over the chemical mechanical polishing stop layer;
- chemical mechanical polishing the leading edge shield material to expose at least a portion of the chemical mechanical polishing stop layer;
- removing the exposed portion of the chemical mechanical polishing stop layer;
- and
- depositing a magnetic pole over the leading edge shield material and the substrate.
Dependencies are inferred from the claim text.