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US 8,508,854 B2Granted
Optical element and method
AssigneeCarl Zeiss SMT GmbH
InventorsEric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
Life of this patent
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Abstract
The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
Claims59
A projection objective, comprising:
- an optical element including electrical conductor tracks at a region of the optical element, wherein:
- during use of the projection objective, the optical element is in a path of optical radiation so that the optical radiation is incident on the optical element;
- the optical element is situated in the projection objective;
- the optical element can ensure a spatially resolved correction of a wavefront of 10% to 15% of a pupil diameter of the projection objective;
- and
- the projection objective is a microlithography projection objective, and wherein:
- the projection objective comprises a field diaphragm downstream of the optical element, the field diaphragm having the form of an image of the object field in an intermediate image plane;
- and/or
- the projection objective comprises a field diaphragm and an aperture diaphragm;
- and/or
- the projection objective comprises a diaphragm downstream of a last optically active area.
8 more elements
An apparatus, comprising:
- a projection objective comprising an optical element including electrical conductor tracks at a region of the optical element,
- wherein:
- during use of the projection objective, the optical element is in a path of optical radiation so that the optical radiation is incident on the optical element;
- the optical element is situated in the projection objective;
- the optical element can ensure a spatially resolved correction of a wavefront of 10% to 15% of a pupil diameter of the projection objective;
- and
- the apparatus is a microlithography projection exposure apparatus, and wherein:
- the projection objective comprises a field diaphragm downstream of the optical element, the field diaphragm having the form of an image of the object field in an intermediate image plane;
- and/or
- the projection objective comprises a field diaphragm and an aperture diaphragm;
- and/or
- the projection objective comprises a diaphragm downstream of a last optically active area.
9 more elements
A projection objective, comprising:
- an optical element including electrical conductor tracks at a region of the optical element;
- and
- a second optical element including electrical conductor tracks, wherein:
- the two optical elements are rotated relative to each other so that their respective conductor tracks are at an angle of 90°, or are rotated relative to each other by an angle of less than 5° azimuthally in interlaced fashion from one another;
- during use of the projection objective, the optical element is in a path of optical radiation so that the optical radiation is incident on the optical element;
- the optical element is situated in the projection objective;
- the optical element can ensure a spatially resolved correction of a wavefront of 10% to 15% of a pupil diameter of the projection objective;
- and
- the projection objective is a microlithography projection objective.
6 more elements
An apparatus, comprising:
- a projection objective, comprising:
- an optical element including electrical conductor tracks at a region of the optical element;
- and
- a second optical element including electrical conductor tracks, wherein:
- the two optical elements are rotated relative to each other so that their respective conductor tracks are at an angle of 90° , or are rotated relative to each other by an angle of less than 5° azimuthally in interlaced fashion from one another;
- during use of the projection objective, the optical element is in a path of optical radiation so that the optical radiation is incident on the optical element;
- the optical element is situated in the projection objective;
- the optical element can ensure a spatially resolved correction of a wavefront of 10% to 15% of a pupil diameter of the projection objective;
- and
- the apparatus is a microlithography projection exposure apparatus.
7 more elements
Dependencies are inferred from the claim text.